Micro-Optics and Photonics

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Advanced Lithography for Micro-Optics, Photonics, and Optical Communication Components

  • Description

  • Micro-optics and photonics are driving innovation across diverse fields, including high-speed optical communication, advanced sensing, next-generation displays (AR/VR), biomedical imaging, and quantum technologies. Heidelberg Instruments provides cutting-edge lithography solutions enabling the fabrication of the essential micro- and nano-scale components powering these advancements. Our systems offer the precision, flexibility, and resolution needed to turn complex optical designs into reality, from initial R&D and rapid prototyping to specialized production.

    Key Applications Enabled by Our Systems

    • Optical Communication & Photonic Integrated Circuits (PICs): Fabricate essential components like low-loss optical waveguides, fiber coupling micro-lenses, WDM gratings (standard, blazed, VLS), ring resonators, and facilitate rapid prototyping cycles for PICs.
    • Imaging & Sensing: Produce high-performance micro-lens arrays (MLAs), complex Fresnel lenses, Diffractive Optical Elements (DOEs), Computer-Generated Holograms (CGHs), and custom optics for compact cameras (smartphones, tablets), AR/VR systems, wavefront sensors, and biomedical devices.
    • Beam Shaping & Conditioning: Create precise micro-prisms, diffraction gratings (e.g., blazed gratings or Variable Line Spacing (VLS) gratings), optical Fourier surfaces, phase plates, and diffusors for homogenizing light sources and tailoring laser beams with high accuracy.
    • Advanced Applications & Replication: Develop nano-optical structures, metalenses, intricate security features, and high-fidelity master molds for cost-effective, high-volume replication techniques (e.g., NIL, LIGA, hot embossing).

    Core Lithography Technologies

    • Direct Write Lithography (DWL): Our core technology offers unparalleled flexibility. By eliminating photomasks, Direct Writing accelerates design iterations, reduces costs for prototyping and low-volume series, and enables direct patterning of complex 2D and 2.5D structures with high precision on various substrates.
    • High-Resolution Grayscale Lithography: Essential for creating intricate 2.5D topographies with smooth surfaces and precise shape control. Ideal for refractive micro-lenses, blazed gratings, and complex optical elements requiring accurate depth modulation (more than 65,000 gray levels with the DWL 66+).
    • Thermal Scanning Probe Lithography (t-SPL): The NanoFrazor pushes the boundaries of nanofabrication, enabling the creation of cutting-edge nano-optical components, metalenses, and quantum devices with sub-15nm resolution, shape freedom, and unique in-situ inspection capabilities, complemented by exquisite single-nanometer depth control (Z-axis) crucial for for defining intricate 2.5D structures.

    Heidelberg Instruments’ Solutions

    Our portfolio includes systems tailored for diverse needs:

    • DWL Series (DWL 66+, DWL 2000 GS / 4000 GS): The benchmark for high-performance grayscale and direct write lithography. The DWL 66+ offers maximum versatility and resolution for R&D, while the DWL GS Series delivers high-throughput, high-precision industrial production of micro-optics and masters.
    • NanoFrazor: The NanoFrazor is the ultimate tool for cutting-edge nano-optics and nanophotonics research and fabrication.

    Partner with Heidelberg Instruments to leverage our advanced lithography expertise and fabricate the high-performance micro-optical and photonic components defining the future. Contact us today.

  • Requirements

  • Very precise shape control

    Excellent surface roughness

    High throughput

    No stitching artifacts

    High resolution

    Flexible substrate material and sizes for different applications

    Diffraction gratings: Strict requirements for surface quality, groove position, and groove profile

  • Solutions

  • High and ultra-high resolution

    200 nm (DWL 66+), 15 nm (NanoFrazor)

    Stitching reduction functions

    Allowing smooth surfaces of large micro-optical elements in thick photoresist

    Substrates from small pieces to G8 panel sizes

    Our systems offer the possibility to choose the right stage size for your application

    Shape optimization

    Used to simplify the compensation of the nonlinear effects

    High precision stage system for accurate pattern placement

    Used to perfectly position micro-optic devices

    Application specific write mode to optimize resolution and throughput

    The choice of write modes enables to make the right compromise for your application (DWL series)

Micro-optics and photonics are driving innovation across diverse fields, including high-speed optical communication, advanced sensing, next-generation displays (AR/VR), biomedical imaging, and quantum technologies. Heidelberg Instruments provides cutting-edge lithography solutions enabling the fabrication of the essential micro- and nano-scale components powering these advancements. Our systems offer the precision, flexibility, and resolution needed to turn complex optical designs into reality, from initial R&D and rapid prototyping to specialized production.

Key Applications Enabled by Our Systems

  • Optical Communication & Photonic Integrated Circuits (PICs): Fabricate essential components like low-loss optical waveguides, fiber coupling micro-lenses, WDM gratings (standard, blazed, VLS), ring resonators, and facilitate rapid prototyping cycles for PICs.
  • Imaging & Sensing: Produce high-performance micro-lens arrays (MLAs), complex Fresnel lenses, Diffractive Optical Elements (DOEs), Computer-Generated Holograms (CGHs), and custom optics for compact cameras (smartphones, tablets), AR/VR systems, wavefront sensors, and biomedical devices.
  • Beam Shaping & Conditioning: Create precise micro-prisms, diffraction gratings (e.g., blazed gratings or Variable Line Spacing (VLS) gratings), optical Fourier surfaces, phase plates, and diffusors for homogenizing light sources and tailoring laser beams with high accuracy.
  • Advanced Applications & Replication: Develop nano-optical structures, metalenses, intricate security features, and high-fidelity master molds for cost-effective, high-volume replication techniques (e.g., NIL, LIGA, hot embossing).

Core Lithography Technologies

  • Direct Write Lithography (DWL): Our core technology offers unparalleled flexibility. By eliminating photomasks, Direct Writing accelerates design iterations, reduces costs for prototyping and low-volume series, and enables direct patterning of complex 2D and 2.5D structures with high precision on various substrates.
  • High-Resolution Grayscale Lithography: Essential for creating intricate 2.5D topographies with smooth surfaces and precise shape control. Ideal for refractive micro-lenses, blazed gratings, and complex optical elements requiring accurate depth modulation (more than 65,000 gray levels with the DWL 66+).
  • Thermal Scanning Probe Lithography (t-SPL): The NanoFrazor pushes the boundaries of nanofabrication, enabling the creation of cutting-edge nano-optical components, metalenses, and quantum devices with sub-15nm resolution, shape freedom, and unique in-situ inspection capabilities, complemented by exquisite single-nanometer depth control (Z-axis) crucial for for defining intricate 2.5D structures.

Heidelberg Instruments’ Solutions

Our portfolio includes systems tailored for diverse needs:

  • DWL Series (DWL 66+, DWL 2000 GS / 4000 GS): The benchmark for high-performance grayscale and direct write lithography. The DWL 66+ offers maximum versatility and resolution for R&D, while the DWL GS Series delivers high-throughput, high-precision industrial production of micro-optics and masters.
  • NanoFrazor: The NanoFrazor is the ultimate tool for cutting-edge nano-optics and nanophotonics research and fabrication.

Partner with Heidelberg Instruments to leverage our advanced lithography expertise and fabricate the high-performance micro-optical and photonic components defining the future. Contact us today.

Very precise shape control

Excellent surface roughness

High throughput

No stitching artifacts

High resolution

Flexible substrate material and sizes for different applications

Diffraction gratings: Strict requirements for surface quality, groove position, and groove profile

High and ultra-high resolution

200 nm (DWL 66+), 15 nm (NanoFrazor)

Stitching reduction functions

Allowing smooth surfaces of large micro-optical elements in thick photoresist

Substrates from small pieces to G8 panel sizes

Our systems offer the possibility to choose the right stage size for your application

Shape optimization

Used to simplify the compensation of the nonlinear effects

High precision stage system for accurate pattern placement

Used to perfectly position micro-optic devices

Application specific write mode to optimize resolution and throughput

The choice of write modes enables to make the right compromise for your application (DWL series)

Application images

Irregular microlens array for microoptics or photonics applications
Irregular Microlens Array - Concave - Pseudo-square arrangement of lenslet. ~18µm (Average side) and ~6µm depth in AZ4562.
Confocal microscope image of a convex fresnel lens, used in micro-optics or photonics applications
DWL 66+: Confocal microscope image of a convex fresnel lens (diameter 506 µm, height 10 µm).
Nano structured phase masks made using thermal scanning probe lithograpy, used for electron-beam shaping
NanoFrazor: Nano structured phase masks made of Silicon-nitride using thermal scanning probe lithography combined with etching. This phase mask offers the intriguiging possibilities in electron-beam shaping.
A fresnel lenses is a volume- and mass-reduced type of micro-optic
DWL 66+: Micrograph showing the image of a Fresnel lens (diameter 506 µm, height 10 µm).
Confocal microscope image of a micro lens array in a honeycomb arrangement.
DWL 66+: Confocal microscope image of a microlens array in a honeycomb arrangement (hexagon radius 10 µm, height 2.7 µm).
Half of a concave fresnel lens used in microoptics and photonics applications
DWL66+ WM III: Half of a concave Fresnel lens, also showing its profile, radius of curvature 840 µm, height 10 µm, effective diameter 1mm.
Confocal microscope image of a pyramid
DWL 66+: Confocal microscope image of a pyramid (pitch 47 µm, height 5.8 µm).
Diffractive optical element (DOE), a type of microoptic, commonly used in light modulation.
DWL66+ HiRes: DOE square size 1 µm 4 steps 800 nm total height view 70° x 5000. Multi-level Diffractive Optical Elements (DOEs) are valuable devices commonly used for light modulation. By changing the phase profile of a laser beam, DOEs can split and shape the beam in well-defined ways, enabling the efficient generation of beam arrays or complex light patterns.
Photonic sieve that focuses light through diffraction and interference using a flat material filled with pinholes.
Photonic sieve made with the NanoFrazor. A photonic sieve focuses light through diffraction and interference using a flat material filled with pinholes, achieving sharper focus than a Fresnel Zone plate.
Confocal microscope image of the central part of a concave fresnel lens.
DWL 66+: Confocal microscope image of the central part of a concave Fresnel lens (diameter of the central part: 120 µm, height 11 µm).
Tailored diffusers and reflectors have applications for example in light sources and illumination.
Tailored diffusers and reflectors have applications for example in light sources and illumination, for example backlight units in LCD displays. This example shows a retro-reflector structure. (Courtesy of karmic.ch)
integrated nanostructured optical reflection gratings on atom chips for quantum applications like gravimeters.
DWL66+ HiRes: 1100 nm pitch grating etched in Si and coated with Al - integrated nanostructured optical reflection gratings on atom chips for quantum applications like gravimeters. (Courtesy of Sascha de Wall, IMPT)
Concave microlenses. Microlenses and microlens arrays are key components in modern-day micro-optics.
DWL66+: Concave microlenses made in ma-P1275G. Microlenses and microlens arrays are key components in modern-day micro-optics. They are used in wavefront sensors, for fiber coupling, or for homogenizing light sources.
Microlenses written in 15 micrometer thick photoresist.
Microlenses written in 15 μm thick AZ4562, with a pitch of 30 μm and a radius of curvature of 16 μm.
A compound structure with a surface texture done by grayscale lithography
This example shows a compound structure – a complex structure made of micro- and nanostructures. The insect eye, for instance (in particular the moth- or fly-eye), consists of a series of compound structures. (Courtesy of ShenZhen Nahum-Eli Optical Technology Inc.)
Parts of a waveguide, waveguides can guide electromagnetic waves, essential in applications like optical communication and sensors
VPG 300 DI: Parts of a waveguide (1 µm wide). Waveguides can guide electromagnetic waves, essential in applications like optical communication and sensors. (Courtesy of IMS Chips)
Ring resonator made from waveguide for light coupling
A ring resonator consists of a closed loop or ring made from a waveguide. Light is coupled into and out of the ring through waveguide arms. The geometry of the ring allows it to support resonant modes. Here the lines are 2 µm wide, the distance between the line and the ring is 500 nm.
Blazed Gratings of various angles exposed on glass.
DWL 66+: Blazed Gratings of various angles exposed on glass.
Grayscale Fresnel Lens, more than 100 µm high, in mr-P 22G XP photoresist.
DWL 66+: Grayscale Fresnel lens, 5 mm diameter, 120 µm high, in mr-P 22G XP photoresist.

Suitable Systems

DWL 66+

DWL 66+ Laser Lithography System

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

DWL 4000 GS Laser Lithography System

DWL 2000 GS / DWL 4000 GS Laser Lithography Systems

  • Direct Write Laser Lithography System

The most advanced industrial grayscale lithography tool on the market.

NanoFrazor tabletop

NanoFrazor Nanolithography Tool

  • Thermal Scanning Probe Lithography System

Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D. 

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Disclaimer: Translations were created with the help of AI. Heidelberg Instruments does not guarantee the completeness and correctness of the translations.

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