Nanoimprint Templates

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Down To Single-Nanometer Precision

  • Description

  • Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

    Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, Grayscale Lithography enables the production of intricate topographies. Maskless Grayscale Laser Lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

    The NanoFrazor, which employs Thermal Scanning Probe Grayscale Lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

  • Requirements

  • High-resolution patterning over large areas

    Accuracy of grayscale nanolithography

    Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor)

  • Solutions

  • Accurate grayscale lithography

    down to single-nanometer accuracy (NanoFrazor)

    Ultra-high resolution

    for templates and copies

    Compatibility of resists

    with various industrial NIL processes

    High write speed

    to make grayscale masters even up to 1×1 m2

Nanoimprint lithography (NIL) is a high-throughput method used for replicating 2D or 2.5D nanostructures in photonics, optics, and nanofluidics applications. The process requires precise master templates generated through direct-write nano- or microlithography.

Although all Heidelberg Instruments are capable of producing 2D structures suitable for replication, Grayscale Lithography enables the production of intricate topographies. Maskless Grayscale Laser Lithography is a fast technique that generates complex topographies in a photoresist layer on a substrate, which is then used as the master for replication. The DWL series is the ideal choice for rapidly fabricating such templates.

The NanoFrazor, which employs Thermal Scanning Probe Grayscale Lithography, can produce masters with higher lateral resolution and an impressive vertical resolution of 1 nm (Z-axis).

High-resolution patterning over large areas

Accuracy of grayscale nanolithography

Additional processing steps (e.g. etching, electroforming) for the final master (NanoFrazor)

Accurate grayscale lithography

down to single-nanometer accuracy (NanoFrazor)

Ultra-high resolution

for templates and copies

Compatibility of resists

with various industrial NIL processes

High write speed

to make grayscale masters even up to 1×1 m2

Application images

Nanoimprint templates: High-fidelity 3d replicas from NanoFrazor Patterns
NanoFrazor: High-fidelity 3D replicas from NanoFrazor patterns. (Courtesy of micro resist technology GmbH)
Nanoimprint templates: Replication of high-resolution features
NanoFrazor: Replication of high-resolution features. (Courtesy of SCIL Nanoimprint Solutions)
Nanoimprint templates: Amplication of 3D patterns by etching
NanoFrazor: Amplication of 3D patterns by etching.

suitable Systems

DWL 66+

DWL 66+

  • Direct Write Laser Lithography System

Our most versatile system for research and prototyping with variable resolution and wide selection of options.

DWL 4000 GS Laser Lithography System

DWL 2000 GS / DWL 4000 GS

  • Direct Write Laser Lithography System

The most advanced industrial grayscale lithography tool on the market.

VPG 300 DI Maskless Direct Imager

VPG 300 DI

  • Maskless Stepper

Maskless direct imager for high-accuracy and high-resolution microstructures.

NanoFrazor tabletop

NanoFrazor

  • Thermal Scanning Probe Lithography System

Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D. 

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