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Recent Blog
The Power of Maskless Lithography for Microfabrication
For decades, photolithography with mask aligners has been the cornerstone of microfabrication. But what if there was a faster, more
Review Technical Workshop 2024 in Taiwan
Organized by our local distributor Stella Technology, the Technical Workshop 2024 for Heidelberg Instruments’ Direct Writing was held on June
Advancing Innovation in Micro- and Nanofabrication: Recap of Technical Workshop at The University of Tokyo
Heidelberg Instruments’ Workshop on Maskless Lithography and Direct Write technology in Japan, hosted at The University of Tokyo’s Takeda Building.
Maskless Lithography Highlighted at Kyoto University
Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical
A new DWL 66+ is Michigan bound!
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through
Congrats to the winners! – Application Image Competition 2023/2024
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Powering Semiconductor Manufacturing
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA
NanoFrazor – A New Generation of Thermal Scanning Probe Lithography
We are thrilled to share some exciting updates about the NanoFrazor!Building on over 20 years of rigorous R&D, the NanoFrazor
MLA 300 successfully installed at Japanese photolithography process service provider
Recognition of the exceptional performance: The successful installation of our MLA 300 Maskless Aligner at a Japanese photolithography service provider
EIPBN 2024 – Driving Nanofabrication Forward
The EIPBN conference, short for the “Electron, Ion, and Photon Beam Technology and Nanofabrication,” is an annual event focusing on
The Power of Maskless Lithography for Microfabrication
For decades, photolithography with mask aligners has been the cornerstone of microfabrication. But what if there was a faster, more
Review Technical Workshop 2024 in Taiwan
Organized by our local distributor Stella Technology, the Technical Workshop 2024 for Heidelberg Instruments’ Direct Writing was held on June
Advancing Innovation in Micro- and Nanofabrication: Recap of Technical Workshop at The University of Tokyo
Heidelberg Instruments’ Workshop on Maskless Lithography and Direct Write technology in Japan, hosted at The University of Tokyo’s Takeda Building.
Maskless Lithography Highlighted at Kyoto University
Review Technical Workshop on June 11th, 2024 We were thrilled to have Kyoto University host one of our recent technical
A new DWL 66+ is Michigan bound!
The Lurie Nanofabrication Facility (LNF) ordered a Heidelberg Instruments DWL 66+ Maskless Laser Lithography System with CHIPS Act funding through
Congrats to the winners! – Application Image Competition 2023/2024
We are thrilled to announce the results of our recent image competition, which showcased the capabilities of our tools in
Powering Semiconductor Manufacturing
Heidelberg Instruments tools, like our Volume Pattern Generator (VPG) series, the Laser Mask Writer ULTRA and the Maskless Aligner MLA
NanoFrazor – A New Generation of Thermal Scanning Probe Lithography
We are thrilled to share some exciting updates about the NanoFrazor!Building on over 20 years of rigorous R&D, the NanoFrazor
MLA 300 successfully installed at Japanese photolithography process service provider
Recognition of the exceptional performance: The successful installation of our MLA 300 Maskless Aligner at a Japanese photolithography service provider
EIPBN 2024 – Driving Nanofabrication Forward
The EIPBN conference, short for the “Electron, Ion, and Photon Beam Technology and Nanofabrication,” is an annual event focusing on