µMLA Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules

The µMLA is a cutting-edge tabletop maskless lithography system, built on the robust µPG platform, which is the world’s best-selling maskless tabletop solution. Ideal as an entry-level tool for R&D and rapid prototyping, it enables high-precision microstructuring across diverse applications, including microfluidics (e.g., cell sorting devices, lab-on-a-chip), small-scale mask-writing, micro-optics and microlens arrays, sensor fabrication, MEMS, and patterning of 2D materials and fan-out electrodes.

Versatile Exposure Modes and Configurations

The µMLA offers flexibility through two distinct exposure modes:

Raster Scan Mode (standard): Ensures fast exposure with excellent image quality, maintaining consistent write times regardless of structure size and pattern density.
Vector Scan Mode (optional): Tailored for continuous, smooth curves, ideal for structures like waveguides, offering both speed and precision.

Three optical configurations enable a customizable balance between resolution and throughput, with easy switching to optimize for specific applications. Additional capabilities include:

Draw Mode: Allows real-time, on-the-fly adjustments to existing patterns and electrical contacts to nanowires or 2D materials.
Grayscale Mode: Supports 2.5D structuring for complex micro-optics.

With a compact design that fits on a standard workbench, the µMLA offers a comprehensive suite of features for versatile, high-quality lithographic applications.

Contact us to learn more about the µMLA and how it can benefit your research and development needs. Go from CAD to exposure in minutes, not weeks.

Versatile Exposure Modes and Configurations

The µMLA offers flexibility through two distinct exposure modes:

Raster Scan Mode (standard): Ensures fast exposure with excellent image quality, maintaining consistent write times regardless of structure size and pattern density.
Vector Scan Mode (optional): Tailored for continuous, smooth curves, ideal for structures like waveguides, offering both speed and precision.

Three optical configurations enable a customizable balance between resolution and throughput, with easy switching to optimize for specific applications. Additional capabilities include:

Draw Mode: Allows real-time, on-the-fly adjustments to existing patterns and electrical contacts to nanowires or 2D materials.
Grayscale Mode: Supports 2.5D structuring for complex micro-optics.

With a compact design that fits on a standard workbench, the µMLA offers a comprehensive suite of features for versatile, high-quality lithographic applications.

Contact us to learn more about the µMLA and how it can benefit your research and development needs. Go from CAD to exposure in minutes, not weeks.

> 210 installed systems

Direct-write Lithography

No mask-related costs, effort, or security risks

Exposure Quality

Edge roughness raster mode 100 nm; vector mode 30 nm; CD uniformity 200 nm

Exposure Speed

4″ wafer in 90 minutes

Grayscale Lithography

With up to 256 gray levels, the grayscale exposure capability is part of the standard configuration

Small Footprint

640 mm x 840 mm x 530 mm / 25″ x 33″ x 21″ – the smallest tabletop maskless lithography tool

Flexible Configuration

Choice of exposure wavelength; a choice of Raster and Vector Scan Modules

Flexible Use

Software enables easy switching for variable resolution and throughput speeds

User-friendly

Intuitive software and tool operation; easy handling of small samples

Plug-and-play Setup

Simplified plug-and-play installation reduces overall implementation time and saves costs

Raster Scan Exposure Mode

Fast with excellent image quality and fidelity; write time is independent of structure size or pattern density. LED light source at 365 nm or 390 nm

Vector Scan Exposure Mode

Patterning continuous structures consisting of curved lines – where smooth contours are required. Laser light source at 405 nm and/or 375 nm

Three Optical Setups

Min. resolution of 0.6 µm, 1 µm and 3 µm; variable resolution within each mode

Optional Overview Camera

Fast and easy location of alignment marks or other features of interest on substrate

Glovebox Integration

Glovebox for patterning of sensitive materials in a controlled Nitrogen environment

Draw Mode

Import and overlay of BMP files on top of the real-time microscope image — as in a virtual mask aligner; simple lines and shapes can be drawn into the real-time camera image for immediate exposure

Optical Autofocus

Perfect exposure of small samples (<10 mm)

Exposure Area

Can be upgraded from 100 x 100 mm² to 150 x 150 mm²

Choice of Exposure, Wavelength and Source

Raster Scan Mode: LED light source at 365 nm or 390 nm. Vector Scan Mode: Laser light source at 405 nm and/or 375 nm

Customer applications

The μMLA also offers a standard Grayscale mode, which allows the creation of structures for a wide range of applications in micro-optics. This example shows micro-lenses written in 15 μm thick AZ4562, with a pitch of 30 μm and a radius of curvature of 16 μm.

A binary diffractive optical element (DOE) comprised of 1 µm² squares and exposed into 500 nm thick Shipley S1805.

A microfluidic system patterned using the μMLA.

Single Ni nanowires (horizontal line in the image) with two precisely aligned thermometer structures used to investigate Co-Ni alloy magneto-thermopower and magneto-resistance. (Courtesy of Tim Boehnert, University of Hamburg)

In many applications, several layers need to be exposed on the same substrate. The cameras of the μMLA can automatically detect alignment markers and adjust the position, rotation, scaling and orthogonality of the exposure to the existing structures. The image shows vernier scales and a “cross-in-cross” structure, employed to measure the remaining offset in x and y direction.

Concentric rings with 1 μm line width were written into the photoresist using the Raster Scan Exposure Mode.

µMLA Dual Comparment Micro Container — Dual-compartment microcontainers for combination therapy, to achieve a physical separation of two drugs followed by a sequential release. The corresponding paper is linked in our library (DTU Kopenhagen: Christfort, J. F., et al. Adv. Therap. 2022, 5, 2200106)

µMLA - Micro fluidic structures_twolayers (closeup) — Micro fluidic structures made in two layers of materials: 1. AZ10XT (14 µm, thermally cross-linked by customer) and 2. SU-8 (20µm, aligned to first layer)
(Courtesy of Max-Planck-Institute for terrestrial microbiology)

Realization of doubly reentrant structures using AZ nLoF 2070 exposed in three steps. Read the application note to learn about the fabrication process.

Microfluidic channels and lattice structures with suspended features fabricated in mr DWL40. Read the application note to learn about the fabrication process.

Why customers choose our systems

"The Heidelberg Instruments maskless system has been a central component in our cleanroom in a glovebox. It has worked beyond our hopes and been central to our fabrication efforts. Support for improving its performance and fixing problems has been excellent."

Dr. Kenneth Stephen Burch, Professor
Boston College
Boston, USA

"Heidelberg Instruments' µMLA succeeds in patterning quick and accurate at the micrometer scale. Its DMD technology is not only precise in terms of writing quality and realignment, but it is also much faster than previous technologies. The optical focus is a decisive advantage for small samples. The very simple and intuitive software interface is also very much appreciated by users and trainers of the equipment, as new users can become autonomous in less than an hour on crucial steps of circuit prototyping."

Dr. Sébastien Delprat, Research Engineer
CEA Saclay
Gif-sur-Yvette, France

"At DTU Nanolab, part of the Technical University of Denmark, we now have multiple maskless aligners from Heidelberg Instruments. These tools fit our research-based operation perfectly, while also providing versatile tools for many of our industrial customers. One specific observation we made since we got our maskless aligners was a significant drop in the number of new masks ordered for our mask aligners, which dropped from about 1 mask per day to about 1 mask per month. Overall, we are very happy with our maskless aligners, both from the personnel side and the user side."

Jens H. Hemmingsen, Process Specialist
DTU Nanolab
Lingby, Denmark

Technical Data

	Write Mode I *	Write Mode II *	Write Mode III *
Writing performance (Raster Scan Exposure Module)
Minimum structure size [μm]	0.6	1	3
Minimum lines and spaces [μm]	0.8	1.5	3
Address grid [nm]	20	50	100
CD uniformity [3σ, nm]	200	300	400
2nd layer alignment over 5 x 5 mm² [nm]	500	500	1000
2nd layer alignment over 50 x 50 mm² [nm]	1000	1000	2000

Write speed	with 390 nm LED / 365 nm LED	with 390 nm LED / 365 nm LED	with 390 nm LED
Write speed	10 mm²/min at 0.6 µm	40 mm²/min at 1 µm	100 mm²/min at 3 µm
Optional write speeds at different minimum structure sizes with “Variable Resolution for Raster Scan Exposure Module”	18 mm²/min at 1 µm	60 mm²/min at 2 µm	160 mm²/min at 4 µm
	25 mm²/min at 2 µm	90 mm²/min at 4 µm	240 mm²/min at 6 µm

Writing performance (Vector Mode Exposure Module)
Minimum feature size [µm]	0.6	1	3
Address grid [nm]	20	20	20
2nd layer alignment over 5 x 5 mm² [nm]	500	500	1000
2nd layer alignment over 50 x 50 mm² [nm]	1000	1000	2000
Maximum linear write speed in Vector Mode	200 mm/s	200 mm/s	200 mm/s
Available spot sizes in Vector Mode [µm]	0.6 / 1 / 2 / 5 / 10	1 / 2 / 5 / 10 / 25	3 / 5 / 10 / 25 /50

System specifications
Maximum substrate size		6″ x 6″
Minimum substrate size		5 x 5 mm²
Substrate thickness		0.1 to 12 mm
Maximum write area		150 x 150 mm²

	Raster scan exposure module	Vector exposure module
Light source	LED; 390 nm or 365 nm	Laser; 405 nm and/or 375 nm

System dimensions (lithography unit)
µMLA	Width x Depth	Height x Weight
Main system housing	640 mm (25") x 840 mm (33")	530 mm (21") x 130 kg (285 lbs)

Installation requirements
Electrical	230 VAC / 6A or 110 VAC / 12A (±5%, 50/60 Hz)
Compressed air	6 - 10 bar
Cleanroom	ISO 6 recommended
Temperature stability	±1 °C

* Only one write mode can be installed on the system

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

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Fabrication Processes of Dual Compartment Microcontainers for Sequential Drug Release	July 27, 2023	Heidelberg Instruments, IDUN DTU	This application note discusses microdevice-based drug delivery, focusing on dual compartment microcontainers (DCMCs) produced via maskless UV lithography. Potential for combination therapy is highlighted.	View
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µMLA Maskless Aligner

Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules

Versatile Exposure Modes and Configurations

Versatile Exposure Modes and Configurations