NanoFrazor Nanolithography Tool

The versatile and modular nanolithography tool

  • Product Description

  • The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

    Key Features

    • High-Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
    • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
    • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
    • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
    • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
    • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

    Applications

    • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
    • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
    • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
    • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
    • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

    The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

    To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

    The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

    Key Features

    • High-Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
    • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
    • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
    • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
    • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
    • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

    Applications

    • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
    • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
    • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
    • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
    • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

    The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

    To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

  • Product Highlights

  • Thermal Scanning Probe Lithography

    New approach to nanopatterning enabling applications not otherwise feasible

    High Resolution

    Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

    Damage-Free Lithography

    No damage from charged particles, no proximity effects, clean lift-off

    Compatibility

    With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

    Unique Thermal Cantilevers

    Integrated microheater and distance sensor for easy exchange and cost-effectiveness

    Precise Overlay and Stitching

    Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

    In-situ Imaging

    Real-time visualization of patterned structure properties

    Low Cost of Ownership

    No need for cleanroom, vacuum pump or expensive consumables

    Scripting

    For easy automation of custom operations
  • Available Modules

  • Laser Sublimation Module

    High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

    Decapede

    Parallel writing with 10 tips

    Standalone housing

    Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

    Full Glovebox Integration

    Integration in glovebox available for nanolithography in a controlled environment

    Grayscale Software Module

    2.5D patterning at <2 nm vertical resolution

    Automated Overlay Software Module

    Automated markerless overlay over existing topography with 25 nm accuracy

    Smart-splitting Software Module

    For optimized large layout handling and ordering of fields

    Dynamic local temperature modulation

    For thermochemical applications using local material modification through heat

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

Key Features

  • High-Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
  • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
  • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
  • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
  • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
  • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

Applications

  • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
  • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
  • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
  • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
  • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.

Key Features

  • High-Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
  • Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
  • In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
  • Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
  • Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
  • Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.

Applications

  • Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
  • 1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
  • Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
  • Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
  • Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.

The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.

To further explore the NanoFrazor, visit our dedicated website at nanofrazor.com. Configure your system and discover how the NanoFrazor can elevate your research to new heights.

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

High Resolution

Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm

Damage-Free Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc. – knowledge resource and best practices available in our “Recipe Book”

Unique Thermal Cantilevers

Integrated microheater and distance sensor for easy exchange and cost-effectiveness

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

In-situ Imaging

Real-time visualization of patterned structure properties

Low Cost of Ownership

No need for cleanroom, vacuum pump or expensive consumables

Scripting

For easy automation of custom operations

Laser Sublimation Module

High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser

Decapede

Parallel writing with 10 tips

Standalone housing

Three-layer acoustic isolation, superior vibration isolation | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)

Full Glovebox Integration

Integration in glovebox available for nanolithography in a controlled environment

Grayscale Software Module

2.5D patterning at <2 nm vertical resolution

Automated Overlay Software Module

Automated markerless overlay over existing topography with 25 nm accuracy

Smart-splitting Software Module

For optimized large layout handling and ordering of fields

Dynamic local temperature modulation

For thermochemical applications using local material modification through heat

Customer applications

Why customers choose our systems

"I enjoy the closed-loop lithography feature that NanoFrazor offers, which is very helpful in high precision lithography, overlay and stitching for the various applications in low dimensional material applications. Also I appreciate the prompt and professional responses (within 24 hours) from the NanoFrazor support team regarding all aspects of our needs in using the system."

Xiaorui Zheng, Assistant Professor, Principal Investigator
Westlake University
Hangzhou, China

"The Nanofrazor offers a unique combination of features in a single compact instrument for nanolithography. I highlight in particular markerless overlay and stitiching with low damage on 2D materials, 3D grayscale nanolithography, and direct thermal conversion and modification of materials."

Francesco Buatier de Mongeot, Professor of Experimental Condensed Matter Physics
Dipartimento di Fisica, Università di Genova
Genova, Italy

Technical Data

Thermal Probe WritingDirect Laser Sublimation
Single TipDecapede
Patterning performance
Minimum structure size [nm]1515600
Minimum Lines and Spaces [half pitch, nm]25251000
Grayscale / 3D-resolution (step size in PPA) [nm]22-
Maximum writing field size [X μm x Y μm]60 x 6060 x 6060 x 60
Field stitching accuracy (markerless, using in-situ imaging) [nm]2525600
Overlay accuracy (markerless, using in-situ imaging) [nm]2525600
Write speed (typical scan speed) [mm/s]115
Write speed (50 nm pixel) [μm²/min] 100010 000100 000
Topography imaging performance
Lateral imaging resolution (feature size) [nm]10
Vertical resolution (topography sensitivity) [nm]<0.5
Imaging speed (@ 50 nm resolution) [μm²/min]100010 000-
Base system features
Substrate sizes1 x 1 mm² to 100 x 100 mm² (150 x 150 mm² possible with limitations)
Thickness: up to 10 mm
Optical microscope0.6 μm digital resolution, 2 μm diffraction limit, 1.0 mm x 1.0 mm field of view, autofocus
Magnetic cantilever holderFast (<1 min) and accurate tip exchange
Vibration isolationActive vibration isolation stage
Optional system features / modularity
Direct laser sublimationLaser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever
DecapedeParallel writing with 10 tips
Standalone housingThree-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg)
Full glovebox integrationIntegration in glovebox available for nanolithography in a controlled environment
NanoFrazor cantilever features (both Single Tip and Decapede)
Integrated componentsTip heater, topography sensor, electrostatic actuation
Tip geometryConical tip with <10 nm radius and 750 nm length
Tip heater temperature range25 °C – 1400 °C (<1 K setpoint resolution)
Base system dimensions & installation requirements
Height × width × depthTable-top unit: 44 cm x 40 cm x 45 cm
Controller: 84 cm x 60 cm x 56 cm
WeightTable-top unit: 50 kg
Controller: 80 kg
Power input1 x 110 or 220 V AC, 10 A
Software features
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting

Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.

Related Publications

TitleDatePublisherSummaryLink
Nanoscale Spatial Tuning of Superconductivity in Cuprate Thin Films via Direct Laser WritingJuly 23, 2026Advanced Functional Materials

Direct laser writing with the Heidelberg Instruments DWL 66⁺ and NanoFrazor enables nanoscale oxygen-stoichiometry tuning in YBCO, precisely controlling superconducting properties and enabling scalable functional nanostructures.

Fourier Pixels for Bidirectional Light ControlJune 24, 2026nature

Fourier pixels use miniaturized diffractive structures and plasmonic waves to both generate and fully characterize optical wavefronts (amplitude, phase, polarization), enabling compact bidirectional light control.

Broadband, compact, and training-free optical processors for parallel image classificationFebruary 21, 2026arXiv Physics/Optics

Compact, training-free optical processor using Fourier surfaces enables broadband, parallel image classification with up to 20 simultaneous computations, achieving high accuracy and scalable, low-power performance.

Engineered Strain in 2D Materials by Direct Growth on Deterministically Patterned Grayscale TopographiesFebruary 10, 2026Advanced Science

Strain is engineered during 2D growth on grayscale topographies, achieving controlled 0–0.5% uni- and multiaxial tensile strain in MoS2 without transfer, enabling direct integration into nanoelectronics.

Beta Site Installation of NanoFrazor with Parallelization Capabilities at EPFLJanuary 20, 2026Heidelberg Instruments

Following the successful introduction of the modular NanoFrazor nanolithography system in 2024, Heidelberg Instruments is proud to announce the installation of the newest NanoFrazor at EPFL.

Strained 2D Semiconductor Lateral Heterojunctions via Grayscale Thermal-Scanning Probe LithographyJanuary 12, 2026Small

Locally strained 2D semiconductor lateral heterojunctions are created by maskless grayscale thermal-Scanning Probe Lithography, enabling tunable asymmetric electrical behavior in MoS₂–Au nanoarrays for nanoelectronic and sensing applications.

Beyond Binary Patterning: Polypropylene Carbonate as a Versatile Thermal Resist for High-Fidelity Grayscale NanofabricationJanuary 8, 2026Microsystems & Nanoengineering (nature)

Polypropylene carbonate enables high-resolution t-SPL nanopatterning via controlled thermal decomposition, achieving 50 nm lateral, sub-nanometer vertical resolution and grayscale pattern transfer for photonic and nanoelectronic fabrication.

Top-Down Fabrication of Silicon Nanowire Field-Effect Transistors Using Thermal Scanning Probe LithographyDecember 16, 2025ACS Applied Nano Materials

Hybrid t-SPL and photolithography fabricate Si nanowire FETs with precise dimensional control, reproducible liquid-gate characteristics, and low-cost processing for biosensing applications.

Gradient Electronic Landscapes in van der Waals HeterostructuresDecember 3, 2025Nano Letters

Thermal scanning probe lithography patterns nanometer-precise topographies in hBN-encapsulated graphene, enabling periodic electric-field modulation and tailored quantum transport potentials beyond planar device geometries.

Defect Engineering in β‐Bi2 SeO5 /Bi2 O2 Se Heterostructures for High‐Resolution Phototransistor ArraysNovember 24, 2025Advanced Materials

Defect-engineered β-Bi2SeO5/Bi2O2Se heterojunctions suppress vacancies, enable type-II charge separation, and achieve high-responsivity phototransistors and high-resolution arrays for advanced optoelectronics.

Three-dimensional nanoscale control of magnetism in crystalline Yttrium Iron GarnetOctober 30, 2025nature communications

Focused UV laser writing enables three-dimensional, non-destructive anisotropy engineering in crystalline YIG, tuning spin-wave band structures, localization, and non-reciprocity for advanced magnonic and magneto-optic devices.

Independent Control of Quality Factor and Circular Dichroism via Intrinsic Chiral Plasmonic Bound States in the ContinuumSeptember 27, 2025Laser & Photonics Reviews

3D symmetry-broken plasmonic metasurfaces enable visible quasi-BIC resonances with independently tunable circular dichroism and Q-factors, achieving high chiroptical performance via nanoscale height-controlled architectures.

Manipulating Anisotropy of Second Harmonic Generation in NbOI2 via Precise Strain EngineeringSeptember 10, 2025Advanced Functional Materials

Precisely oriented strain engineering in NbOI2 enhances second harmonic generation up to 19-fold, quantitatively linking strain direction with nonlinear susceptibility and enabling tunable 2D ferroelectric optoelectronics.

Josephson Junction Device Fabrication with the NanoFrazorAugust 18, 2025Heidelberg Instruments Nano

High-resolution, damage-free NanoFrazor lithography enables fast and reliable fabrication of Josephson junctions for quantum and nanoelectronics applications.

High-Resolution Lift-Off Process with the NanoFrazorAugust 18, 2025Heidelberg Instruments Nano

This application note describes the NanoFrazor’s high-resolution lift-off process for creating sub-100 nm metal features with low line edge roughness using thermal lithography.

Confinement-Enhanced Core–Shell Avalanche PhotodetectorsJuly 8, 2025ACS Nano

A SiO2-passivated Si nanowire/graphene nanoresonator enhances 1550 nm absorption and confined avalanche multiplication, achieving 56.6 A/W responsivity and 2.6×10⁴ gain for CMOS-compatible NIR photodetection.

Nanofabrication of All-Dielectric Metasurfaces through Pulsed Thermal Scanning Probe LithographyJuly 2, 2025Scientific Reports

Pulsed thermal scanning probe lithography enables sub-10 nm patterning on insulating silica without conductive layers, advancing all-dielectric metasurface fabrication and material compatibility in nanofabrication.

Noninvasive Deterministic Nanostructures Lithography on 2D Transition Metal DichalcogenidesJune 23, 2025Advanced Engineering Materials

Noninvasive t-SPL enables high-resolution nanolithography on transparent substrates, enabling tunable plasmonic nanostructures for applications in nanophotonics, sensing, and thermoplasmonics.

Hybrid-Contact Engineering for Enhanced P-Type Performance in WSe2 Field-Effect TransistorsJune 17, 2025Nanotechnology

Hybrid edge-top contacts in WSe2 FETs mitigate Fermi-level pinning, boosting p-type conduction, lowering contact resistance and Schottky barriers, enabling efficient complementary post-silicon electronics.

Fourier-Tailored Light–Matter Coupling in van der Waals HeterostructuresMay 27, 2025ACS Nano

Fourier-patterned hBN/WS2 van der Waals heterostructures enhance exciton–waveguide coupling, enabling exciton-polariton formation near strong coupling for advanced optoelectronic and quantum devices.

Reconfigurable Artificial Synapses Based on Ambipolar Environmentally Stable Tellurium for Neuromorphic ComputingMay 24, 2025ACS Applied Materials & Interfaces

Ambipolar tellurium floating-gate devices enable nonvolatile memory with high retention, endurance, large on/off ratios, and reconfigurable excitatory–inhibitory synapses, achieving >90% accurate neuromorphic image recognition.

Multifunctional Logic-in-Memory Circuits Based on Reconfigurable WSe2 Transistors via Enhanced AmbipolarityMay 15, 2025ACS Nano

Scanning probe lithography enhances ambipolar WSe2 transport, enabling nonvolatile reconfigurable memory, transistor, and diode modes with ~10¹⁰ on/off ratios, realizing ambient logic-in-memory circuits.

Diffraction of Light from Optical Fourier SurfacesApril 28, 2025ACS Photonics

Precisely fabricated optical Fourier surfaces show measured diffraction matching electrodynamic simulations, outperforming binary profiles and scalar models, enabling accurate Fourier-spectrum engineering for advanced holography and optical computing.

Combination of Thermal Scanning Probe Lithography and Directed Self-Assembly of Block CopolymersApril 24, 2025SPIE. Digital Library

Combining thermal scanning probe lithography with block copolymer self-assembly enables sub-20 nm, high-density quantum device patterning, achieving depth-amplified nanoholes and sub-10 nm placement accuracy.

Strategies to Extend Resolution Limits for Direct Write LithographyApril 23, 2025SPIE. Digital Library

This presentation introduces methods for optimizing various direct-writing lithography systems from Heidelberg Instruments to push the resolution limit for smaller structures in collaboration with IMS Chips Germany.

Detection of Dynamic Temperature Modulation using a Thermal Scanning Probe Lithography (t-SPL) SystemApril 8, 2025AIP Publishing

Thermal scanning probe lithography enables nanoscale thermal diffusivity measurement via localized periodic heating and temperature-wave phase analysis, achieving 10–100 nm resolution without miniaturized sensing.

Dynamic BIC in Customizable Hydrogel Metagratings for Advanced Information SecurityMarch 27, 2025Advanced Functional Materials

Water-responsive hydrogel metagratings with grayscale thermal patterning enable humidity-tunable q-BIC resonances for multistage visible optical encryption and concealed Morse-code decryption.

Toward Phonon-Limited Transport in Two-Dimensional Transition Metal Dichalcogenides by Oxygen-Free FabricationFebruary 24, 2025ACS Nano

An oxygen-free fabrication approach boosts MoS2 and WS2 FET mobility toward phonon limits, achieving record values and showing oxygen chemisorption critically degrades 2D transistor performance.

Hybrid Contact for High‐Performance MoS2 Transistors via Hard‐Mask Scanning Probe LithographyJanuary 20, 2025Advanced Materials

Hard-mask scanning probe lithography enables hybrid contacts for MoS2 FETs, improving carrier injection, reducing contact resistance and Schottky barriers, achieving high on-current, large on/off ratios, and ~18 nm patterning.

Selective Placement of Functionalised DNA Origami via Thermal Scanning Probe Lithography PatterningNovember 4, 2024Materials Advances

Thermal scanning probe lithography organized functionalized DNA origami into predefined nanoarrays with single-molecule precision, positioning gold nanoparticles and quantum dots for heterofunctional bionanotechnology applications.

Quantitative Mapping of Smooth Topographic Landscapes Produced by Thermal Scanning-Probe LithographyOctober 28, 2024Nature Protocols

This work introduces FunFit, open-source software fitting analytical functions to SPM data, enabling precise fabrication, transfer, and feedback analysis of tSPL-patterned polymer and hBN nanoscale landscapes.

Nanoscale-Localized Multiplexed Biological Activation of Field Effect Transistors for Biosensing ApplicationsSeptember 24, 2024Nanoscale

Thermal scanning probe lithography enables nanoscale, multiplexed biofunctionalization of FET biosensors, achieving sub-20 nm precision and ultrasensitive SARS-CoV-2 detection with graphene FETs.

High-resolution patterning of nanowire-based quantum devices with the NanoFrazorSeptember 18, 2024Heidelberg Instruments Nano

The NanoFrazor offers a unique patterning solution, combining t-SPL and laser mix and match lithography.

Liquid Metal Oxide-Assisted Integration of High-k Dielectrics and Metal Contacts for Two-Dimensional ElectronicsSeptember 18, 2024ACS Nano

Liquid metal oxide enables ultrathin high-k HfO2 integration on 2D semiconductors, achieving smooth interfaces, low-leakage WS2 transistors, minimal hysteresis, and scalable dielectric-contact stacking for nanoelectronics.

Damage-free nanolithography enabling superior device performanceSeptember 16, 2024Heidelberg Instruments Nano

Thermal scanning probe lithography enabled by NanoFrazor helps to fabricate devices with superior performance due to its damage-free patterning principle.

Assembly and Bilayer Liftoff of Periodic Nanostructures with Sub-20 nm Resolution Using Thermal Scanning Probe LithographySeptember 11, 2024MDPI

Optimized thermal scanning probe lithography achieved 10 nm resolution. Combined with bilayer liftoff, sub-20 nm metal structures were fabricated and validated for photonic dipole devices.

Scalable Layer‐Controlled Oxidation of Bi2 O2 Se for Self‐Rectifying Memristor Arrays With sub‐pA Sneak CurrentsSeptember 9, 2024Advanced Materials

UV-assisted oxidation created β-Bi2SeO5/Bi2O2Se heterostructure memristors with self-rectifying switching, high ON/OFF ratios, sub-pA sneak currents, sub-100 ns speed, low power, enabling scalable neuromorphic arrays.

Deterministic grayscale nanotopography to engineer mobilities in strained MoS2 FETsAugust 16, 2024nature communications

Engineered nanotopography induces tensile strain in MoS2 FETs, significantly enhancing carrier mobility and on-state current, promising advancements for 2D material-based electronics.

NanoFrazor for Direct Nanoscale Chemical Conversion of MaterialsAugust 16, 2024Heidelberg Instruments Nano

Chemical conversion using a thermal scanning probe can be used to make biosensors with advanced architecture and tailor surface chemistry to create nanostructures.

Fabrication of a hybrid device for the integration of light-triggered proton pumpsJune 23, 2024Micro and Nano Engineering (ScienceDirect)

A novel method for fabricating a hybrid device that integrates light-triggered proton pumps into a network of nanochannels for applications in directed ion transport.

Nano-Ironing van der Waals Heterostructures toward Electrically Controlled Quantum DotsJune 6, 2024ACS Applied Materials & Interfaces

Nanoironing van der Waals heterostructures enhances interface quality, significantly improving electrical performance and enabling controlled quantum dot formation for advanced quantum technologies.

Prospects of nano-lithographic tools for the fabrication of surface-enhanced Raman spectroscopy (SERS) substratesJune 4, 2024Micro and Nano Engineering (ScienceDirect)

This review discusses and compares different lithographic techniques for fabricating SERS substrates, highlighting their strengths and limitations, and explores their potential for commercial applications.

Chemically Amplified, Dry-Develop Poly(aldehyde) PhotoresistMay 15, 2024ECS Journal of Solid State Science and Technology

The effects of incorporating a base quencher into a poly(phthalaldehyde-co-propanal) photoresist to enhance the performance of dry-develop resist in a direct-write UV lithography tool.

Thermal scanning probe and laser lithography for patterning nanowire based quantum devicesApril 4, 2024Nanotechnology

The NanoFrazor combines thermal scanning probe and laser writing lithography to fabricate InSb nanowire quantum devices, achieving quasi-ballistic transport with reduced fabrication-induced disorder.

Thermal nanoconversion of ferromagnetic nanoislandsMarch 14, 2024Applied Physics Letters

This paper examines the use of thermal nanoconversion (TNC) to modify the magnetic properties of nickel-iron (Ni80Fe20) nanoislands.

Tailored Micromagnet Sorting Gate for Simultaneous Multiple Cell Screening in Portable Magnetophoretic Cell‐On‐Chip PlatformsMarch 5, 2024Advanced Functional Materials

Novel technique for selectively sorting magnetic carriers and cells using a multi-notched disk micromagnet, enabling precise manipulation even in low magnetic fields.

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplificationFebruary 23, 2024Microsystems & Nanoengineering

A novel method for amplifying the depth of grayscale nanopatterns in dielectric materials like SiO2 using a combination of t-SPL and optimized dry etching techniques.

Fraxicon for Optical Applications with Aperture ∼1 mm: Characterisation StudyJanuary 30, 2024Nanomaterials

This paper describes the fabrication and characterisation of a flat conical lens (fraxicon) with a diameter of 0.2 mm for use in miniaturised optical applications.

Transistors platform for rapid and parallel detection of multiple pathogens by nanoscale-localized multiplexed biological activationJanuary 26, 2024nature

This paper describes a scalable and CMOS-compatible fabrication strategy for modifying individual field-effect transistors (FETs) with distinct bioreceptors.

Multi‐ and Gray‐Scale Thermal Lithography of Silk Fibroin as Water‐Developable Resist for Micro and NanofabricationJanuary 17, 2024Advanced Science

This paper describes a hybrid thermal lithography method that uses silk fibroin as a water-developable resist for the fabrication of micro and nanoscale structures.

Achieving Reliable and Ultrafast Memristors via Artificial Filaments in Silk FibroinNovember 7, 2023Advanced Materials

This paper investigates using biocompatible silk fibroin (SF) as a switching medium in silver/SF/gold (Ag/SF/Au) memristors.

Generating smooth potential landscapes with thermal scanning-probe lithographyNovember 1, 2023Journal of Physics: Materials

Scanning probe microscopy with a NanoFrazor achieves atomic precision, enabling controlled material manipulation and high-resolution lithography, with broad applications in photonics, electronics, and nanomaterials science.

Thermal Scanning-Probe Lithography for Broad-Band On-Demand Plasmonic Nanostructures on Transparent SubstratesOctober 3, 2023ACS Applied Nano Materials

Thermal scanning-probe lithography (t-SPL) enables high-resolution nanolithography on transparent substrates with conductive oxide films, creating tunable plasmonic nanostructures for nanophotonics and sensing applications.

Complete logic operations in an ambipolar tellurium homojunction via non-invasive scanning probe lithographySeptember 22, 2023Device

Low-dimensional semiconductors, like tellurium nanoribbons, enable miniaturized logic devices via ambipolar conduction. Non-invasive lithography creates transistors performing all seven basic logic operations.

Exploiting Thermal Scanning Probe Lithography for the Fabrication of Micro and Nano Electronic DevicesSeptember 1, 2023IEEE

Thermal scanning probe lithography enables fast fabrication of micro/nano structures with 100 nm resolution, enhancing electronic performance through gold coating and resistivity characterization.

Nanopatterning of 2D materials by block copolymer self-assemblyAugust 31, 2023Technical University of Denmark (DTU)

Nanopatterning using block copolymer (BCP) self-assembly is a promising way to advancements in applications ranging from water treatment technologies to energy-efficient devices.

Nano-Rectennas for Harnessing Infrared EnergyAugust 30, 2023Serdar B. Tekin

This thesis optimizes MIM rectenna diodes via barrier engineering and scaling, improving responsivity, asymmetry and coupling efficiency, demonstrating enhanced THz rectification and proposing nanoscale rectenna fabrication.

Novel Mixed-Dimensional hBN-Passivated Silicon Nanowire Reconfigurable Field Effect Transistors: Fabrication and CharacterizationAugust 22, 2023ACS Applied Materials & Interfaces

This work demonstrates a reconfigurable field-effect transistor (RFET) combining a Si nanowire with a 2D hBN dielectric, improving electrical characteristics and enabling dynamic polarity control.

Recent Advances in Direct Optical Patterning of Inorganic Materials and DevicesAugust 15, 2023Advanced Physics Research

Direct patterning technology enables cost-effective design and production of devices, enhancing the fabrication of inorganic materials for optoelectronic, electronic, and energy applications.

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser WritingAugust 1, 2023Advanced Materials Technologies

Nanomaterials derive unique properties from their nanostructure. A perspective explores advanced nanofabrication techniques to modify properties in condensed matter systems, discussing applications and future prospects.

Bilayer Lift-Off for NanoFrazor LithographyJuly 27, 2023Heidelberg Instruments Nano

Explore bilayer lift-off with NanoFrazor lithography, addressing advantages, process details, and examples, including high-quality contacts and structures as small as 7 nm.

Ultra-High Resolution Pattern Transfer on NanoFrazor LithographyJuly 27, 2023Heidelberg Instruments Nano

High-resolution lithography is crucial for current and future technologies, requiring dimension reduction. NanoFrazor lithography, multi-layer stacks, and alternative strategies for superior patterns are discussed.

High-sensitive two-dimensional PbI2 photodetector with ultrashort channelJuly 26, 2023Frontiers of Physics

This study reports a PbI2-based photodetector with the highest responsivity (172 A/W) achieved, using thermal scanning probe lithography for ultrashort channel fabrication to enhance performance.

Spin Transport in Superconducting and Ferromagnetic HeterostructuresJune 30, 2023Liam O'Brien

This thesis engineers S/F and F/HM heterostructures, demonstrating high-quality Nb films, tunable spin transport, perpendicular anisotropy, and superconducting spin valves probing super spin currents via neutron reflectivity and tr-MOKE.

A New Method of AFM‐Based Nanolithography Using Frequency Enhanced Electrochemical Pressure Solution EtchingMarch 1, 2023Advanced Materials Technologies

This paper investigates Frequency Enhanced Electrochemical Pressure Solution (FEEPS) as a novel nanolithography method for etching silica surfaces with an AFM tip.

Spectral tuning of Bloch Surface Wave resonances by light-controlled optical anisotropyFebruary 20, 2023Nanophotonics

This work demonstrates dynamic control of resonant modes in a 2D bull’s eye cavity using optically-induced anisotropy, enabling precise tuning in metasurface-based optics.

Spin Transport and Associated Background Effects in All-Metallic Non-Local Spin ValvesFebruary 16, 2023Alexander James Wright

This thesis investigates spin transport and relaxation mechanisms in all-metallic non-local spin valves across varied materials, temperatures and magnetic fields, clarifying spurious effects for low-power spintronic applications.

Shaping Interfaces for Manipulation and Imaging of Nano-Objects in Nanofluidic ConfinementJanuary 22, 2023ETH Zürich

This study demonstrates nanoscale particle manipulation using nanofluidic slits, thermal scanning probe lithography, and electrostatic interactions for sorting, trapping, and surface charge modulation applications.

Deterministic Thermal Sculpting of Large‐Scale 2D Semiconductor NanocircuitsNovember 27, 2022Advanced Materials Interfaces

A scalable nanolithography method enables precise engineering of 2D TMD nanocircuits, like MoS2, for ultra-compact electronic and photonic devices with controlled thickness and excellent conductivity.

Edge-Contact MoS2 Transistors Fabricated Using Thermal Scanning Probe LithographySeptember 7, 2022ACS Applied Materials & Interfaces

Thermal scanning probe lithography (t-SPL) fabricates MoS2-based field-effect transistors, achieving high on/off ratios without damaging materials, offering a gentle alternative to electron beam lithography.

Placement of Biological Membrane Patches in a Nanofluidic Gap With Control Over Position and OrientationJuly 19, 2022Advanced Materials Interfaces

Purple membranes from Halobacterium salinarum are precisely positioned and oriented in nanofluidic confinement for integration into light-driven nanoscale hybrid devices.

Far-Field and Non-Intrusive Optical Mapping of Nanoscale StructuresJuly 1, 2022Nanomaterials

This study analyzes far-field optical mapping of nanostructures using CLSM and radially polarized light, achieving 74 nm resolution for LDOS, crucial for high-density optical storage.

Direct Heat-Induced Patterning of Inorganic NanomaterialsJune 9, 2022Journal of the American Chemical Society

The HIPIN method uses heat-induced ligand transformation to pattern nanomaterials, enabling direct, wavelength-diverse lithography for advanced manufacturing of quantum dot electronic and optoelectronic devices.

Thermal scanning probe lithographyMay 1, 2022nature reviews methods primer

Thermal scanning probe lithography is a powerful nanofabrication method with 10 nm lateral resolution and 1 nm depth resolution, applicable in biomedicine, nanomagnetism, and nanoelectronics.

Nanofabrication and Characterization of Spin-Orbit Logic DevicesApril 28, 2022

This work explores thermal scanning probe lithography (t-SPL) to fabricate devices with sub-50 nm features, enabling energy-efficient non-volatile computing and memory devices using 2D materials.

Anisotropic Particle Fabrication Using Thermal Scanning Probe LithographyApril 22, 2022ACS Applied Materials & Interfaces

Nanoparticles’ optical and physicochemical properties are modulated via a novel, efficient nanolithographic method producing diverse monodispersed shapes, ensuring precise size, shape, and material control.

Single CdSe Quantum Dots Positioned in Nanostructured Heterogeneous Templates: Implications for High-Precision NanoassemblyApril 6, 2022ACS Applied Nano Materials

This work develops a multiphysical strategy for precise assembly of colloidal quantum dots using nanostructured templates, controlling electric fields, surface energy, and topography.

Thermal scanning probe lithography using Parylene C as thermal resistFebruary 22, 2022Micro & Nano Letters

Thermal scanning probe lithography with Parylene C as a thermal resist enables high-resolution (∼40 nm) patterning and direct pattern transfer using deep reactive ion etching.

Scanning Probe Lithography: State-of-the-Art and Future PerspectivesJanuary 29, 2022Micromachines

Scanning probe lithography (SPL) is a promising nanofabrication technique for nanoelectronics, data storage, and bioengineering, though it is still mainly used for prototyping.

Advanced MEMS/NEMS Fabrication and SensorsOctober 12, 2021nature

This book introduces new and unique fabrication, micromachining, and integration manufacturing methods for MEMS and NEMS devices, as well as novel nanomaterials for sensor fabrications.

Tip-Based Nanomachining on Thin Films: A Mini ReviewSeptember 21, 2021Nanomanufacturing and Metrology

Mini review of AFM tip-based nanomachining on thin films, covering materials, applications, and future prospects in nanooptics, electronics, and data storage.

Freeform nanostructuring of hexagonal boron nitrideMay 1, 2021arXiv Physics/Optics

Hexagonal boron nitride (hBN), now available as atomically smooth flakes, offers unique properties in optoelectronics and nanoelectronics. Researchers demonstrate freeform nanostructuring for advanced device architectures.

Interferometric scattering of a single plasmonic nanoparticle cluster assembled in a nanostructured templateApril 1, 2021Optics Express

Examining single Au nanoparticle cluster light scattering on nanostructured substrates, revealing two substrate effects via Green’s tensor theory for plasmonic nanostructure spectral interpretation.

Cost and Time Effective Lithography of Reusable Millimeter Size Bone Tissue Replicas With Sub-15 nm Feature Size on A Biocompatible PolymerFebruary 5, 2021Advanced Functional Materials

Bio-tSPL enables cost-effective, high-precision fabrication of reusable, biocompatible 3D bone tissue replicas for stem cell culture, tissue-mimetic biofunctionalization, drug testing, and regenerative medicine.

Structurally and morphologically engineered chalcogenide materials for optical and photonic devicesJanuary 26, 2021Journal of Optical Microsystems

This paper explores advanced techniques like multiphoton lithography and thermal scanning probe lithography for patterning chalcogenide materials, enabling nanoscale features and functional photonic devices.

Nanofabrication of graphene field-effect transistors by thermal scanning probe lithographyJanuary 1, 2021APL Materials

Thermal scanning probe lithography (t-SPL) shows promise for scalable nanofabrication in nanoelectronics. It produces high-performance graphene-based transistors with simplified processing, reducing time and cost.

Deterministic Assembly of Single Sub-20 nm Functional Nanoparticles Using a Thermally Modified Template with a Scanning NanoprobeNovember 1, 2020Advanced Materials

A deterministic technique uses hot scanning nanoprobes to assemble sub-20 nm nanoparticles, including quantum dots, into 2D arrays and complex nanostructures for various applications.

The Lithographer – Quantum IssueOctober 26, 2020Heidelberg Instruments

Quantum Issue of The Lithographer, published in October 2020. Topics include: Quantum Technology, Maskless Aligners, Grayscale Lithography, 2D Materials.

Thermomechanical Nanostraining of Two-Dimensional MaterialsOctober 1, 2020Nano Letters

Nanoindentation via thermomechanical scanning probe allows precise, nanoscale strain engineering in 2D materials like MoS2 and graphene, achieving modulated bandgaps and investigating localized strain effects.

The Potential of Combining Thermal Scanning Probes and Phase-Change Materials for Tunable MetasurfacesOctober 1, 2020Advanced Optical Materials

Metasurfaces enable versatile optical wavefront control; active phase-change materials like germanium telluride offer compact, reconfigurable near-infrared metasurfaces, avoiding typical limitations.

Nanometer scale resolution, multi-channel separation of spherical particles in a rocking ratchet with increasing barrier heightsJuly 8, 2020Physical Review Applied

This nanoparticle size-separation device uses a nanofluidic Brownian motor with electrostatic barriers, achieving a separation resolution of approximately 2 nm for gold particles.

Spatial defects nanoengineering for bipolar conductivity in MoS2July 1, 2020nature communications

Controlling defects in monolayer MoS2 using thermochemical scanning probe lithography enables precise p- and n-type doping, vital for nanoelectronics, p-n junctions, and high rectification ratios.

Thermomechanical Nanocutting of 2D MaterialsJune 1, 2020Advanced Materials

A thermomechanical indentation technique enables precise cutting of monolayer 2D with 20 nm resolution, offering potential for electronic and photonic nanodevice fabrication.

Optical Fourier surfacesJune 1, 2020Heidelberg Instruments, nature

Thermal Scanning Probe Lithography and templating creating optical surfaces containing multiple specified sinusoids, enabling advanced diffractive optics, photonics, and applications in emerging photonics fields.

Direct Patterning of Metal Chalcogenide Semiconductor MaterialsMay 14, 2020Advanced Functional Materials

A low-cost, high-resolution direct patterning method using metal-organic precursors enables fabrication of 2D/3D semiconductor structures with sub-50 nm resolution for various nanodevices.

Thermal scanning probe lithography – a reviewApril 1, 2020Heidelberg Instruments, Microsystems & Nanoengineering (nature)

Review of Thermal Scanning Probe Lithography (t-SPL) covering its capabilities for high-resolution nanolithography and material interactions, providing insights for nanofabrication and material science challenges.

Nano/Microscale Thermal Field Distribution: Conducting Thermal Decomposition of Pyrolytic-Type Polymer by Heated AFM ProbesMarch 7, 2020Nanomaterials

This study investigates temperature distribution between heated AFM tips and materials, using PPA film to create programmable nano/microscale pyramid structures for scanning thermal microscopy applications.

Optically Inspired Nanomagnonics with Nonreciprocal Spin Waves in Synthetic AntiferromagnetsJanuary 21, 2020Advanced Materials

A versatile platform utilizes spin waves for optically inspired wave-based processing, advancing nanoscale devices with wavefront engineering, focusing, interference, and unique properties.

Laser Heat-Mode Lithography: Principle and MethodsNovember 29, 2019

This book explains laser heat-mode lithography, covering principles, system design, feature size manipulation, and applications, offering a versatile, simple, and tunable approach for nanofabrication.

Deterministic Deposition of Nanoparticles with Sub-10 nm ResolutionNovember 6, 2019Nano Letters

A nanofluidic slit method enables precise nanoparticle placement using geometry-induced energy landscapes, achieving 8 nm accuracy with electrostatic trapping, focusing, and adhesive contact.

Sub-10 nm Resolution Patterning of Pockets for Enzyme Immobilization with Independent Density and Quasi-3D Topography ControlOctober 14, 2019ACS Applied Materials & Interfaces

The study demonstrates thermochemical scanning probe lithography (tc-SPL) for precise enzyme nanopatterning on polymer surfaces, achieving single-enzyme resolution, high throughput, and controlled enzyme density.

Phase masks for electron microscopy fabricated by thermal scanning probe lithographyOctober 3, 2019Micron

Silicon-nitride phase masks are fabricated using thermal scanning probe lithography, avoiding ion implantation, offering high accuracy, and generating electron vortex and Bessel beams.

Scanning Probe Thermometry to study Thermoelectricity and Dissipation at Nanoscale JunctionsAugust 21, 2019ETH Zürich

This thesis explores heat transport and dissipation in nanoelectronics using high-resolution scanning probe thermometry, revealing nanoscale thermal phenomena, defects, and thermoelectric effects.

Oxidation and Thermal Scanning Probe Lithography for High-Resolution Nanopatterning and NanodevicesAugust 1, 2019Electrical Atomic Force Microscopy for Nanoelectronics

Scanning probe lithography (SPL) offers high resolution, precise positioning, and material versatility, but its throughput limitations can be addressed through mix-and-match lithography strategies.

Replication of a Tissue Microenvironment by Thermal Scanning Probe LithographyMay 3, 2019ACS Applied Materials & Interfaces

Thermal scanning probe lithography (t-SPL) efficiently creates biocompatible nanoscale topographies for cell culture, enabling rapid prototyping of substrates for studying cell-matrix interactions.

High-throughput protein nanopatterningMarch 14, 2019Faraday Discussions

This work demonstrates high-throughput, sub-10 nm enzyme nanopatterning using thermochemical scanning probe lithography (tc-SPL), advancing bio-nanotechnology and molecular-level biological studies.

Ultra compact electrochemical metallization cells offering reproducible atomic scale memristive switchingMarch 7, 2019Communications Physics

Miniaturized Ag/SiO₂/Pt memristors enabling fast, low-energy, and highly reproducible atomic-scale switching for next-generation non-volatile memory applications.

Monolayer MoS2 Nanoribbon Transistors Fabricated by Scanning Probe LithographyFebruary 27, 2019Nano Letters

This work demonstrates the fabrication of 30 nm monolayer MoS2 nanoribbon field-effect transistors using scanning probe lithography, achieving high performance with channel widths below 100 nm.

Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithographyJanuary 1, 2019nature electronics

Thermal Scanning Probe Lithography enables precise metal electrode patterning on 2D semiconductors like MoS2, improving device performance with vanishing Schottky barriers and exceptional properties.

Combination of Thermal Scanning Probe Lithography and Ion Etching to Fabricate 3D Silicon Nanopatterns with Extremely Smooth SurfaceJune 5, 2018ScienceDirect

Thermal scanning probe lithography enables nanoscale prototyping, but dry etching increases roughness. Optimized ion-beam polishing using a polymer mask achieved sub-nanometer smooth silicon surfaces.

Nanofluidic rocking Brownian motorsMarch 1, 2018Science

Creating precise nanofluidic slits, utilizing electrostatic forces and oscillating fields, enables controlled transport of nanoparticles, demonstrated with 60nm gold spheres and efficient sorting of particles.

High-Aspect Ratio Nanopatterning via Combined Thermal Scanning Probe Lithography and Dry EtchingAugust 5, 2017ScienceDirect

Thermal scanning probe lithography enables rapid nanofabrication in resist. Combined with optimized plasma etching, hard masks and heat treatment, shallow patterns were amplified 100× into silicon, achieving 240 nm lines, 4 µm depth, smooth surfaces and vertical sidewalls.

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