Products
High-Precision Tools for Research and Industrial Applications
Heidelberg Instruments provides a powerful range of lithography solutions that bridge the gap between academic research and high-volume industrial production. Our portfolio delivers unmatched precision across the entire fabrication spectrum—from high-resolution nanofabrication and versatile microfabrication to advanced photomask production and complex 2.5D grayscale lithography.
By combining the agility of maskless technology with the 24/7 reliability required for industrial scale-up, we empower users to create intricate patterns on a vast array of substrates. Whether you are iterating quantum designs in an R&D lab or managing high-throughput manufacturing with systems like the MLA 300, our technology offers the flexibility and sub-micron accuracy needed to drive the next generation of MEMS, micro-optics, and semiconductor technologies.
Use our product finder below to find the ideal system for your specific application.
Research & Development
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µMLA Maskless Aligner
Configurable and compact tabletop maskless aligner with raster scan and vector exposure modules. -
MLA 150 Maskless Aligner
The fastest maskless tool for rapid prototyping, the alternative to the mask aligners. Perfect for standard binary lithography. -
DWL 66+ Laser Lithography System
Our most versatile system for research and prototyping with variable resolution and wide selection of options. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
NanoFrazor Nanolithography Tool
Versatile & modular tool combining Thermal Scanning Probe Lithography, Direct Laser Sublimation, and advanced automation for cutting-edge R&D.
Industrial
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MLA 300 Maskless Aligner
Optimised for industrial production with highest throughput and seamless integration into industrial production lines. -
DWL 2000 GS / DWL 4000 GS Laser Lithography Systems
The most advanced industrial grayscale lithography tool on the market. -
VPG+ 200 / VPG+ 400 / VPG+ 800 Volume Pattern Generators
Powerful production tools for standard photomasks and microstructures in i-line resists. -
VPG+ 1400 FPD / VPG+ 1850 FPD Volume Pattern Generators
Photomask production on large substrates, perfect for display applications. -
VPG 300 DI Maskless Stepper
Maskless direct imager for high-accuracy and high-resolution microstructures. -
ULTRA Semiconductor Writer
A tool specifically designed to produce mature semiconductor photomasks.
