The Modern Standard in Lithography
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Product Description
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Are you slowed down by the high costs and long lead times of photomasks? Do you want to iterate designs instantly without the lengthy training required for traditional mask aligners?
Discover the MLA 150 and the world of digital lithography.
The modern, maskless aligner replaces legacy technology with a fast, flexible, and remarkably easy-to-use solution engineered for the highest degree of performance. By using a digital mirror device (DMD) as a dynamic mask, the MLA 150 overcomes the drawbacks of physical photomasks. Go from a digital design to a perfectly patterned substrate in minutes, empowering your users to accelerate research in fields like quantum devices, MEMS, micro-optics, and life sciences.
Why the MLA 150 is the Ideal Choice for Your Lab
The MLA 150 was designed from the ground up to solve the core challenges of academic and industrial R&D facilities. It directly addresses issues like long lead times for photomasks, high recurring costs, and the steep learning curve of traditional systems.
Engineered for the Multi-User Facility
Reduce your training overhead and maximize tool uptime. The MLA 150 is so intuitive that new users can be fully qualified to work independently in less than one hour. Its user-friendly software and streamlined workflow are perfectly suited for a shared lab environment, which is why the MLA 150 has become an essential tool in leading cleanrooms worldwide.
Unmatched Flexibility for Advanced Research and More
Your work isn’t standard — and your lithography tool shouldn’t be either. Whether you’re advancing cutting-edge research, accelerating innovation through rapid prototyping, or producing high-quality small series, the MLA 150 adapts to your needs, not the other way around.
- Handle a Broad Range of Resists: Install one or two different laser wavelengths (375 nm and/or 405 nm) simultaneously to expose the entire range of broadband, g-, h-, and i-line photoresists without hardware changes.
- Work with Challenging Substrates: Specialized vacuum chucks allow you to easily handle difficult samples, including small substrate pieces down to 3×3 mm², thin foils, and warped wafers.
- Create 2.5D and High-Aspect-Ratio Structures: Use the integrated Grayscale Exposure Mode to fabricate complex 2.5D microstructures, or the High-Aspect-Ratio Mode to pattern thick resists with steep sidewalls, ideal for MEMS and microfluidics.
- Interactive ‘Draw Mode’: Directly draw and expose patterns onto the live camera image of your sample—perfect for quick prototyping or precisely placing electrodes onto unique features like graphene flakes or nanowires.
High Speed, High Precision, No Compromises
User-friendly doesn’t mean lower performance. The MLA 150 delivers the speed and accuracy you need to push the boundaries of fabrication.
- Sub-Micron Resolution: Achieve a minimum feature size down to 0.45 μm to create complex, high-resolution devices.
- Outstanding Throughput: Expose a full 150 mm wafer in less than 16 minutes.
- Advanced Automated Alignment: The system achieves 250 nm alignment accuracy and digitally compensates for offset, rotation, scaling, and shearing—adjustments impossible with physical masks.
- Perfect Focus: A dynamic autofocus system ensures sharp, uniform features, effectively handling patterned, warped, or delicate substrates.
- Ultimate Stability: An integrated environmental chamber with temperature-controlled laminar airflow (±0.1°C) minimizes thermal expansion effects, ensuring stable and repeatable results.
Drastically Reduce Your Operating Costs
Eliminate the largest and most persistent expense in lithography: the photomask. With the MLA 150, there are no mask procurement costs and no associated multi-week lead times. You also eliminate cleaning and storage efforts and remove the risk of costly breakage. Combined with a laser lifetime of 10-20 years and easy maintenance, the MLA 150 offers an exceptionally low total cost of ownership.
Key Applications
From fundamental physics to applied biosciences, the MLA 150 is the trusted tool for:
- Nanofabrication: Quantum devices, 2D materials, semiconductor nanowires
- MEMS & MOEMS: Sensors, actuators, micro-optical elements, microfluidics
- Materials Science: Patterning of novel materials
- Life Sciences: Lab-on-a-chip devices, biosensors
Join Hundreds of Leading Institutions
See why top universities and research centers worldwide have chosen the MLA 150 to replace their mask aligners. Contact us to discover how to empower your users and modernize your lab.
In 2025, we were celebrating 10 years of the MLA 150. Learn more about its history and the people behind it on our special anniversary page.
Are you slowed down by the high costs and long lead times of photomasks? Do you want to iterate designs instantly without the lengthy training required for traditional mask aligners?
Discover the MLA 150 and the world of digital lithography.
The modern, maskless aligner replaces legacy technology with a fast, flexible, and remarkably easy-to-use solution engineered for the highest degree of performance. By using a digital mirror device (DMD) as a dynamic mask, the MLA 150 overcomes the drawbacks of physical photomasks. Go from a digital design to a perfectly patterned substrate in minutes, empowering your users to accelerate research in fields like quantum devices, MEMS, micro-optics, and life sciences.
Why the MLA 150 is the Ideal Choice for Your Lab
The MLA 150 was designed from the ground up to solve the core challenges of academic and industrial R&D facilities. It directly addresses issues like long lead times for photomasks, high recurring costs, and the steep learning curve of traditional systems.
Engineered for the Multi-User Facility
Reduce your training overhead and maximize tool uptime. The MLA 150 is so intuitive that new users can be fully qualified to work independently in less than one hour. Its user-friendly software and streamlined workflow are perfectly suited for a shared lab environment, which is why the MLA 150 has become an essential tool in leading cleanrooms worldwide.
Unmatched Flexibility for Advanced Research and More
Your work isn’t standard — and your lithography tool shouldn’t be either. Whether you’re advancing cutting-edge research, accelerating innovation through rapid prototyping, or producing high-quality small series, the MLA 150 adapts to your needs, not the other way around.
- Handle a Broad Range of Resists: Install one or two different laser wavelengths (375 nm and/or 405 nm) simultaneously to expose the entire range of broadband, g-, h-, and i-line photoresists without hardware changes.
- Work with Challenging Substrates: Specialized vacuum chucks allow you to easily handle difficult samples, including small substrate pieces down to 3×3 mm², thin foils, and warped wafers.
- Create 2.5D and High-Aspect-Ratio Structures: Use the integrated Grayscale Exposure Mode to fabricate complex 2.5D microstructures, or the High-Aspect-Ratio Mode to pattern thick resists with steep sidewalls, ideal for MEMS and microfluidics.
- Interactive ‘Draw Mode’: Directly draw and expose patterns onto the live camera image of your sample—perfect for quick prototyping or precisely placing electrodes onto unique features like graphene flakes or nanowires.
High Speed, High Precision, No Compromises
User-friendly doesn’t mean lower performance. The MLA 150 delivers the speed and accuracy you need to push the boundaries of fabrication.
- Sub-Micron Resolution: Achieve a minimum feature size down to 0.45 μm to create complex, high-resolution devices.
- Outstanding Throughput: Expose a full 150 mm wafer in less than 16 minutes.
- Advanced Automated Alignment: The system achieves 250 nm alignment accuracy and digitally compensates for offset, rotation, scaling, and shearing—adjustments impossible with physical masks.
- Perfect Focus: A dynamic autofocus system ensures sharp, uniform features, effectively handling patterned, warped, or delicate substrates.
- Ultimate Stability: An integrated environmental chamber with temperature-controlled laminar airflow (±0.1°C) minimizes thermal expansion effects, ensuring stable and repeatable results.
Drastically Reduce Your Operating Costs
Eliminate the largest and most persistent expense in lithography: the photomask. With the MLA 150, there are no mask procurement costs and no associated multi-week lead times. You also eliminate cleaning and storage efforts and remove the risk of costly breakage. Combined with a laser lifetime of 10-20 years and easy maintenance, the MLA 150 offers an exceptionally low total cost of ownership.
Key Applications
From fundamental physics to applied biosciences, the MLA 150 is the trusted tool for:
- Nanofabrication: Quantum devices, 2D materials, semiconductor nanowires
- MEMS & MOEMS: Sensors, actuators, micro-optical elements, microfluidics
- Materials Science: Patterning of novel materials
- Life Sciences: Lab-on-a-chip devices, biosensors
Join Hundreds of Leading Institutions
See why top universities and research centers worldwide have chosen the MLA 150 to replace their mask aligners. Contact us to discover how to empower your users and modernize your lab.
In 2025, we were celebrating 10 years of the MLA 150. Learn more about its history and the people behind it on our special anniversary page.
> 250 installed systems
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Product Highlights
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Perfect for Multi-User Facilities
Less than 1h training to fully qualify as a userFast and Accurate Alignment
250 nm front alignment, backside alignment, alignment error compensationFlexible
Two lasers can be installed simultaneously on the same system to expose the whole range of photoresist
Different exposure modes available for fast or high-quality structuring
Additional vacuum chucks for challenging samples like small substrates, foils, or warped substratesLow Operation Costs and Easy Maintenance
10-20 years of laser lifetimeDirect-Write Lithography
No mask-related costs, effort, or security risksGrayscale Mode
For simple 2.5D structuresExposure Quality
Edge roughness 60 nm; CD uniformity 100 nm; autofocus compensation for warped/corrugated substratesMinimum Feature Size
Two different write modes available with a minimum feature size down to 0.45 μmUser-Friendly
Specifically designed software and workflow make the tool operation fast and easyExposure Speed
150 mm wafer in <16 min with 405 nm laser -
Available Modules
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Exposure Wavelength
Diode laser sources at 375 nm and/or 405 nm can be mounted together and used interchangeably to expose different photoresistsExchangeable Chucks
Additional vacuum chucks for challenging samples like small substrates, foils, or warped substrates
Customized vacuum chuck layout upon requestDraw Mode
Import and overlay of BMP files on top of the real-time microscope image – as in a virtual mask aligner; simple lines and shapes can be drawn into the real-time camera image for immediate exposureAutofocus
Air-gauge or optical autofocus for perfect exposure of small samples (less than 10 mm)Variable Substrate Sizes
From 3 mm to 9″Advanced Field Alignment
Automatic field-by-field alignment on individual dies on the wafer for superior alignment accuracyOptional Automatic Loading System
Can handle masks up to 7″ and wafers up to 8″. A second cassette station, and a prealigner and wafer scanner are available as options.
Are you slowed down by the high costs and long lead times of photomasks? Do you want to iterate designs instantly without the lengthy training required for traditional mask aligners?
Discover the MLA 150 and the world of digital lithography.
The modern, maskless aligner replaces legacy technology with a fast, flexible, and remarkably easy-to-use solution engineered for the highest degree of performance. By using a digital mirror device (DMD) as a dynamic mask, the MLA 150 overcomes the drawbacks of physical photomasks. Go from a digital design to a perfectly patterned substrate in minutes, empowering your users to accelerate research in fields like quantum devices, MEMS, micro-optics, and life sciences.
Why the MLA 150 is the Ideal Choice for Your Lab
The MLA 150 was designed from the ground up to solve the core challenges of academic and industrial R&D facilities. It directly addresses issues like long lead times for photomasks, high recurring costs, and the steep learning curve of traditional systems.
Engineered for the Multi-User Facility
Reduce your training overhead and maximize tool uptime. The MLA 150 is so intuitive that new users can be fully qualified to work independently in less than one hour. Its user-friendly software and streamlined workflow are perfectly suited for a shared lab environment, which is why the MLA 150 has become an essential tool in leading cleanrooms worldwide.
Unmatched Flexibility for Advanced Research and More
Your work isn’t standard — and your lithography tool shouldn’t be either. Whether you’re advancing cutting-edge research, accelerating innovation through rapid prototyping, or producing high-quality small series, the MLA 150 adapts to your needs, not the other way around.
- Handle a Broad Range of Resists: Install one or two different laser wavelengths (375 nm and/or 405 nm) simultaneously to expose the entire range of broadband, g-, h-, and i-line photoresists without hardware changes.
- Work with Challenging Substrates: Specialized vacuum chucks allow you to easily handle difficult samples, including small substrate pieces down to 3×3 mm², thin foils, and warped wafers.
- Create 2.5D and High-Aspect-Ratio Structures: Use the integrated Grayscale Exposure Mode to fabricate complex 2.5D microstructures, or the High-Aspect-Ratio Mode to pattern thick resists with steep sidewalls, ideal for MEMS and microfluidics.
- Interactive ‘Draw Mode’: Directly draw and expose patterns onto the live camera image of your sample—perfect for quick prototyping or precisely placing electrodes onto unique features like graphene flakes or nanowires.
High Speed, High Precision, No Compromises
User-friendly doesn’t mean lower performance. The MLA 150 delivers the speed and accuracy you need to push the boundaries of fabrication.
- Sub-Micron Resolution: Achieve a minimum feature size down to 0.45 μm to create complex, high-resolution devices.
- Outstanding Throughput: Expose a full 150 mm wafer in less than 16 minutes.
- Advanced Automated Alignment: The system achieves 250 nm alignment accuracy and digitally compensates for offset, rotation, scaling, and shearing—adjustments impossible with physical masks.
- Perfect Focus: A dynamic autofocus system ensures sharp, uniform features, effectively handling patterned, warped, or delicate substrates.
- Ultimate Stability: An integrated environmental chamber with temperature-controlled laminar airflow (±0.1°C) minimizes thermal expansion effects, ensuring stable and repeatable results.
Drastically Reduce Your Operating Costs
Eliminate the largest and most persistent expense in lithography: the photomask. With the MLA 150, there are no mask procurement costs and no associated multi-week lead times. You also eliminate cleaning and storage efforts and remove the risk of costly breakage. Combined with a laser lifetime of 10-20 years and easy maintenance, the MLA 150 offers an exceptionally low total cost of ownership.
Key Applications
From fundamental physics to applied biosciences, the MLA 150 is the trusted tool for:
- Nanofabrication: Quantum devices, 2D materials, semiconductor nanowires
- MEMS & MOEMS: Sensors, actuators, micro-optical elements, microfluidics
- Materials Science: Patterning of novel materials
- Life Sciences: Lab-on-a-chip devices, biosensors
Join Hundreds of Leading Institutions
See why top universities and research centers worldwide have chosen the MLA 150 to replace their mask aligners. Contact us to discover how to empower your users and modernize your lab.
In 2025, we were celebrating 10 years of the MLA 150. Learn more about its history and the people behind it on our special anniversary page.
Are you slowed down by the high costs and long lead times of photomasks? Do you want to iterate designs instantly without the lengthy training required for traditional mask aligners?
Discover the MLA 150 and the world of digital lithography.
The modern, maskless aligner replaces legacy technology with a fast, flexible, and remarkably easy-to-use solution engineered for the highest degree of performance. By using a digital mirror device (DMD) as a dynamic mask, the MLA 150 overcomes the drawbacks of physical photomasks. Go from a digital design to a perfectly patterned substrate in minutes, empowering your users to accelerate research in fields like quantum devices, MEMS, micro-optics, and life sciences.
Why the MLA 150 is the Ideal Choice for Your Lab
The MLA 150 was designed from the ground up to solve the core challenges of academic and industrial R&D facilities. It directly addresses issues like long lead times for photomasks, high recurring costs, and the steep learning curve of traditional systems.
Engineered for the Multi-User Facility
Reduce your training overhead and maximize tool uptime. The MLA 150 is so intuitive that new users can be fully qualified to work independently in less than one hour. Its user-friendly software and streamlined workflow are perfectly suited for a shared lab environment, which is why the MLA 150 has become an essential tool in leading cleanrooms worldwide.
Unmatched Flexibility for Advanced Research and More
Your work isn’t standard — and your lithography tool shouldn’t be either. Whether you’re advancing cutting-edge research, accelerating innovation through rapid prototyping, or producing high-quality small series, the MLA 150 adapts to your needs, not the other way around.
- Handle a Broad Range of Resists: Install one or two different laser wavelengths (375 nm and/or 405 nm) simultaneously to expose the entire range of broadband, g-, h-, and i-line photoresists without hardware changes.
- Work with Challenging Substrates: Specialized vacuum chucks allow you to easily handle difficult samples, including small substrate pieces down to 3×3 mm², thin foils, and warped wafers.
- Create 2.5D and High-Aspect-Ratio Structures: Use the integrated Grayscale Exposure Mode to fabricate complex 2.5D microstructures, or the High-Aspect-Ratio Mode to pattern thick resists with steep sidewalls, ideal for MEMS and microfluidics.
- Interactive ‘Draw Mode’: Directly draw and expose patterns onto the live camera image of your sample—perfect for quick prototyping or precisely placing electrodes onto unique features like graphene flakes or nanowires.
High Speed, High Precision, No Compromises
User-friendly doesn’t mean lower performance. The MLA 150 delivers the speed and accuracy you need to push the boundaries of fabrication.
- Sub-Micron Resolution: Achieve a minimum feature size down to 0.45 μm to create complex, high-resolution devices.
- Outstanding Throughput: Expose a full 150 mm wafer in less than 16 minutes.
- Advanced Automated Alignment: The system achieves 250 nm alignment accuracy and digitally compensates for offset, rotation, scaling, and shearing—adjustments impossible with physical masks.
- Perfect Focus: A dynamic autofocus system ensures sharp, uniform features, effectively handling patterned, warped, or delicate substrates.
- Ultimate Stability: An integrated environmental chamber with temperature-controlled laminar airflow (±0.1°C) minimizes thermal expansion effects, ensuring stable and repeatable results.
Drastically Reduce Your Operating Costs
Eliminate the largest and most persistent expense in lithography: the photomask. With the MLA 150, there are no mask procurement costs and no associated multi-week lead times. You also eliminate cleaning and storage efforts and remove the risk of costly breakage. Combined with a laser lifetime of 10-20 years and easy maintenance, the MLA 150 offers an exceptionally low total cost of ownership.
Key Applications
From fundamental physics to applied biosciences, the MLA 150 is the trusted tool for:
- Nanofabrication: Quantum devices, 2D materials, semiconductor nanowires
- MEMS & MOEMS: Sensors, actuators, micro-optical elements, microfluidics
- Materials Science: Patterning of novel materials
- Life Sciences: Lab-on-a-chip devices, biosensors
Join Hundreds of Leading Institutions
See why top universities and research centers worldwide have chosen the MLA 150 to replace their mask aligners. Contact us to discover how to empower your users and modernize your lab.
In 2025, we were celebrating 10 years of the MLA 150. Learn more about its history and the people behind it on our special anniversary page.
> 250 installed systems
Perfect for Multi-User Facilities
Fast and Accurate Alignment
Flexible
Different exposure modes available for fast or high-quality structuring
Additional vacuum chucks for challenging samples like small substrates, foils, or warped substrates
Low Operation Costs and Easy Maintenance
Direct-Write Lithography
Grayscale Mode
Exposure Quality
Minimum Feature Size
User-Friendly
Exposure Speed
Exposure Wavelength
Exchangeable Chucks
Customized vacuum chuck layout upon request
Draw Mode
Autofocus
Variable Substrate Sizes
Advanced Field Alignment
Optional Automatic Loading System
Customer applications









Why customers choose our systems
"The MLA 150 is a very good compromise between flexibility, throughput, and performance. In our multiuser facilities, it is highly appreciated for fast prototyping on substrates of various dimensions and shapes. Because the acquisition of the MLA 150 has been a game changer in our lithography department we decided to get a second one."
Dr. Philippe Flückiger, Director of Operations
Ecole Polytechnique Fédérale de Lausanne (EPFL) Center of MicroNanoTechnology (CMi)
Lausanne, Switzerland
"At DTU Nanolab, part of the technical university of Denmark, we now have multiple maskless aligners from Heidelberg instruments. These tools fit our research-based operation perfectly, while also providing versatile tools for many of our industrial customers. One specific observation we made since we got our maskless aligners was a significant drop in the number of new masks ordered for our mask aligners, which dropped from about 1 mask per day to about 1 mask per month. Overall, we are very happy with our maskless aligners, both from the personnel side and the user side."
Jens H. Hemmigsen, Process Specialist
DTU Nanolab (Technical University of Denmark)
Lyngby, Denmark
"The MLA 150 direct laser writer, with its ease-of-use and versatility, is the ideal photolithography equipment. Since photomasks are no longer required to expose the wafer, the MLA 150 has helped to dramatically reduce the time & costs associated to the development and research on prototypes that require frequent changes in the layout."
Dr. Julien Dorsaz, Senior Photolithography Engineer
EPFL (CMi)
Lausanne, Switzerland
"The speed, ease of use, and accuracy of the MLA 150 led us to choose it over a mask aligner.
It is one of our key tools for photolithography work at MCN. Users employ it for direct writing on various sample types (silicon, glass, quartz, diamond, lithium niobate, etc.) and sizes (ranging from 3 mm × 3 mm up to 7 in × 7 in mask plates), as well as for photomask fabrication.
Exposing a full 6-in wafer with 2 µm-diameter circles and 2 µm spacings would not have been possible without it."
Dr. Yang Choon Lim, Senior Process Engineering Team Lead
Melbourne Centre for Nanofabrication (MCN)
Melbourne, Australia
"We work largely in a pilot-line and development environment and find that the flexibility of the MLA 150 is extremely useful for testing new design concepts. This is particularly true for the numerous research users we support in the cleanroom. We also find that the MLA 150 provides great value for our wafer scale-up work, where we can test different device designs on smaller tiles before committing to large wafer mask–based processes.
The MLA 150 is one of the most consistently utilized pieces of equipment in our cleanroom. Users find its ability to jump straight from concept to design to sample exposure extremely appealing."
Dr. Tom Peach, Senior Process Engineer
Institute for Compound Semiconductors, Cardiff University
Cardiff, UK
Technical Data
| Write Mode I * | Write Mode II * | |
|---|---|---|
| Writing performance | ||
| Minimum feature size [μm] | 0.6 (0.45 optional) | 1 |
| Minimum Lines and Spaces [μm] | 0.8 (0.45 optional) | 1.2 |
| Global 2nd layer alignment [nm] | 500 | 500 |
| Local 2nd layer alignment [nm] | 250 | 250 |
| Backside alignment [nm] | 1000 | 1000 |
| Max. write speed 405 nm laser [mm²/min] | 400 | 1400 |
| Max. write speed 375 nm laser [mm²/min] | 400 | 600 |
| System features | |
|---|---|
| Light source | Diode lasers: 8 W at 405 nm, 2.8 W at 375 nm, or both |
| Substrate sizes | Variable: 3 x 3 mm² to 9″ x 9″ | Customizable on request |
| Substrate thickness | 0 - 12 mm |
| Maximum exposure area | 150 x 150 mm² | Optional: 200 x 200 mm² |
| Temperature controlled flow box | Temperature stability ± 0.1 °C |
| Real-time autofocus | Air-gauge or optical |
| Autofocus compensation range | 180 μm |
| Grayscale | 128 gray levels |
| Software features | Exposure wizard, resist database, automatic labeling and serialization, Draw Mode for CADless exposures, substrate tracking / history |
| System dimensions (lithography unit) | |
| Height × width × depth | 1950 mm × 1300 mm × 1300 mm |
| Weight | 1100 kg |
| Installation requirements | |
| Electrical | 230 VAC ± 5%, 50/60 Hz, 16 A |
| Compressed air | 6 - 10 bar |
| Economical considerations | |
| Saves on the cost of photomasks | |
| Low running costs for maintenance, energy consumption, spare parts | |
| Solid state laser light sources with lifetime of several years | |
| * Only one write mode can be installed on the system |
Please note
Specifications depend on individual process conditions and may vary according to equipment configuration. Write speed depends on pixel size and write mode. Design and specifications are subject to change without prior notice.
Related Publications
| Title | Date | Publisher | Summary | Link |
|---|---|---|---|---|
| Gold Electron Microscopy Grids with Anisotropic Foil Geometry Enable On-Grid Contact Guidance | October 9, 2026 | ACS Applied Materials & Interfaces | The paper presents a scalable microfabrication process for all-gold EM grids that enables high-resolution cryo-EM and geometry-guided cellular organization through anisotropic foil holes. | |
| Novel Interdigitated Electrode Conductometric Sensor for Rapid, Sensitive, and Selective Detection of cTnI Biomarkers in Saliva | September 28, 2026 | Advanced NanoBiomed Research | A novel conductometric IDE sensor using cTnI nanoMIPs enables rapid, sensitive, selective, and noninvasive cTnI detection in saliva, achieving a 0.08 fM detection limit with minimal sample volume. | |
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| On-Chip Waveguide-Integrated Light Sources Using MoS2/WSe2 Moiré Superlattices on a Silicon Photonic Platform | August 7, 2026 | Science Advances | MoS₂/WSe₂ moiré superlattices enable coherent, room-temperature telecom light sources integrated with silicon photonics, offering enhanced emission and long coherence for on-chip photonic applications. | |
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| Shape-Conformal Porous Frameworks for Full Coverage of Neural Organoids and High-Resolution Electrophysiology | February 18, 2026 | nature biomedical engineering | A self-assembling, shape-matched 3D soft interface enables high-density electrophysiology, stimulation, imaging, and neuromodulation in human neural organoids, enabling high-resolution, network-level activity mapping and disease modeling. | |
| Self-Powered Ultrasensitive Photodetector based on 3C-SiC/Si Heterojunction with Electron-Confined Architecture | February 1, 2026 | ChemRxiv | This study presents the first island-like 3C-SiC/Si heterojunction self-powered photodetector, achieving high responsivity, detectivity, 65% EQE, and fast response at 637 nm without external bias. | |
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| Advancing neural interfaces: a framework for the fabrication and characterization of freestanding micro-nanodevices | January 12, 2026 | Microsystems & Nanoengineering (nature) | A comprehensive framework for fabricating, harvesting, and characterizing freestanding micro-nanodevices, enabling minimally invasive, wireless neural interfaces with subcellular resolution and scalable neuromodulation potential. | |
| A Mechanophenotyping Chip for High-Throughput Detection of Metastatic Bacteria-Infected Circulating Tumor Cells | January 8, 2026 | nature communications | LesM microfluidic chip captures and mechanophenotypes circulating tumor cells, distinguishing bacteria-infected breast cancer cells via deformation, linking microbial cargo and biomechanics to metastatic risk and antibiotic response. | |
| Bubble detachment from patterned solid surfaces: Roles of wettability contrast and domain geometry | December 15, 2025 | ScienceDirect | Patterned wettability contrasts control bubble detachment, revealing contact-line pinning, geometry-dependent volumes, and deviations from classical models, offering insights to improve hydrogen electrolysis and mineral flotation efficiency. | |
| Stretchable Porous Membranes for Barrier Tissue Models with Real-Time Measurement and Biomimetic Cyclic Strain | November 13, 2025 | MDPI | Gold microelectrodes patterned on porous, stretchable PDMS membranes enable impedance sensing under cyclic strain, advancing barrier tissue models and applications in wearables, robotics, and devices. | |
| A nonsurgical brain implant enabled through a cell–electronics hybrid for focal neuromodulation | November 5, 2025 | nature biotechnology | Circulatronics uses immune cell–electronics hybrids for nonsurgical brain neuromodulation, enabling intravenous delivery, autonomous targeting of inflammation, wireless photovoltaic stimulation, and neural control without invasive surgery. | |
| Texture-engineered fabrication of ultraflat, 6-inch single-crystal Cu(111) wafers | October 29, 2025 | Science Advances | Scalable fabrication of twin-boundary-free Cu(111) wafers enables ultraflat 6-inch substrates for high-quality wafer-scale graphene with excellent uniformity, low resistance, and high carrier mobility performance metrics. | |
| Batch fabrication of ultra-sharp atomic force microscope probes with stair-shaped handles for high-precision imaging | October 21, 2025 | Microsystems & Nanoengineering (nature) | Scalable batch-fabricated silicon AFM probes integrate ultra-sharp high-aspect-ratio tips and stair-shaped handles, enabling 5 nm resolution, unobstructed laser detection, compatibility, and durable high-fidelity nanoscale imaging. | |
| Single-Step 3D Patterning of Negative Resists via Maskless Aligner | October 2, 2025 | Heidelberg Instruments | Demonstrates single-step 3D patterning of negative resists using maskless aligner, enabling complex microstructures for biomedical, MEMS, and microfluidic applications. | |
| A Decade of Discovery: Heidelberg Instruments’ MLA 150 Maskless Aligner Turns 10 | September 18, 2025 | Heidelberg Instruments | Heidelberg Instruments proudly celebrates the 10th anniversary of the MLA 150 Maskless Aligner—a breakthrough that has redefined high-resolution lithography in cleanrooms around the world. | |
| µCodes: A Universal Grid Platform for Microscale Mapping, Microscopy Navigation, and Multimodal Imaging | August 21, 2025 | Small | µCodes is a microgrid system enabling precise sample tracking and image alignment across diverse optical and electron microscopy modalities. | |
| Microscopic geared metamachines | August 20, 2025 | nature communications | Optically driven metasurfaces power on-chip micromachines, enabling lithographically fabricated gear trains and micromechanisms down to tens of micrometers with sub-micrometer precision and scalable integration capabilities. | |
| Low-loss superconducting resonators fabricated from tantalum films grown at room temperature | August 16, 2025 | nature communications | Room-temperature growth of α-tantalum on silicon using niobium seed layers yields superconducting resonators with state-of-the-art quality factors, enabling low-thermal-budget integration for qubit circuits applications. | |
| Volatile and non-volatile nano-electromechanical switches fabricated in a CMOS-compatible silicon-on-insulator foundry process | July 11, 2025 | Microsystems & Nanoengineering (nature) | CMOS-compatible SOI foundry integration enables scalable silicon NEM switches with low-voltage operation, volatile and nonvolatile modes, paving high-density logic and memory for extreme environments. | |
| Picoeukaryote-based biohybrid microrobots for active delivery in the kidney | July 11, 2025 | Science Advances | Picoeukaryote-based biohybrid microrobots enable active drug delivery in confined environments, demonstrating strong motility, kidney penetration, long-term retention, biosafety, and immune evasion in vivo. | |
| Engineering flexible superblack materials | May 19, 2025 | nature communications | A scalable silicon-mold and polymer-casting platform produces flexible, durable superblack materials with 0.15% reflectance, angle-insensitive Lambertian behavior, and customizable surfaces for advanced optical applications. | |
| Tunable chiral magneto-transport through band structure engineering in magnetic topological insulators Mn(Bi1−xSbx)2Te4 | May 16, 2025 | Science Advances | Sb alloying in Mn(Bi,Sb)2Te4 tunes Berry curvature, spin chirality, and harmonic Hall responses, inducing topological transitions and reversible anomalous Hall effects for chiral spin-orbitronic devices. | |
| Strategies to Extend Resolution Limits for Direct Write Lithography | April 23, 2025 | SPIE. Digital Library | This presentation introduces methods for optimizing various direct-writing lithography systems from Heidelberg Instruments to push the resolution limit for smaller structures in collaboration with IMS Chips Germany. | |
| Wire suspended on a v-groove cavity to measure gas physical properties | May 31, 2024 | Heidelberg Instruments, University of Twente | Thermal flow sensors measure fluid flow by detecting heat dissipation from a heated wire. A novel silicon-based design compensates for fluctuations ensuring accuracy. | |
| Hollow silicon-based microneedle array for dermal interstitial fluid extraction fabricated by only dry etching on wafer scale | May 31, 2024 | EPFL, Heidelberg Instruments, Xsensio | Silicon-based microneedles enable interstitial fluid biomarker extraction. Proposed dry etching technique achieves mass production compatibility, enhancing biomedical applications for minimally invasive diagnostics and monitoring. | |
| Biosynthesis enhancement of tropodithietic acid (TDA) antibacterial compound through biofilm formation by marine bacteria Phaeobacter inhibens on micro-structured polymer surfaces | February 1, 2024 | Heidelberg Instruments, Technical University of Denmark (DTU) | Microfluidic channels cultivate Phaeobacter inhibens biofilms on diverse polymer surfaces, offering biocontrol potential in aquaculture by mitigating antibiotic risks. Creating diverse surfaces to promote biosynthesis. | |
| Small Projectiles Featuring Triple-Layer Metal Cladding with Potential Applications in the field of Cell Transfection | September 27, 2023 | Heidelberg Instruments, IDUN DTU | Micro-projectiles were created through maskless UV lithography, O2 plasma treatment, silicon etching, and metal cladding. These conical micro-projectiles have applications in magnetically guided cell transfection. | |
| Spin-acoustic control of silicon vacancies in 4H silicon carbide | September 17, 2023 | nature electronics | Spin-acoustic control demonstrated on a 4H silicon carbide-based bulk acoustic resonator allows frequency-tunable probing of resonances, aiding in dynamic strain distribution analysis for microelectromechanical systems. | |
| Aperture-Controlled Fabrication of All-Dielectric Structural Color Pixels | June 29, 2023 | ACS Applied Materials & Interfaces | CMOS-compatible aperture-controlled deposition enabled microscopic all-dielectric structural color pixels, producing vibrant wafer-scale images through interference effects without costly electron-beam lithography. | |
| Self-aligned single-electrode actuation of tangential and wineglass modes using PMN-PT | May 17, 2023 | Microsystems & Nanoengineering (nature) | PMN–PT thin film disks, with single-electrode actuation, showcase self-aligned tangential and wineglass modes for high-frequency bulk acoustic wave (BAW) MEMS gyroscopes. | |
| MEMS micro-coils for magnetic neurostimulation | May 1, 2023 | Biosensors and Bioelectronics (ScienceDirect) | Innovative MEMS micro-coil probe fabrication overcame brain stimulation challenges, validated in vivo. International collaboration advances micro-magnetic stimulation for applications like artificial vision and hearing. |
